Zobrazeno 1 - 10 of 496 pro vyhledávání: '"W, Shive"'
1
Aluminum Reduction in SC1
Autor: Larry W. Shive, Sasha Joseph Kweskin
Publikováno v: Solid State Phenomena. 219:28-31
RCA clean has evolved since 1965 [1]. Typically used before critical thermal steps, depositions/etches, or after strip operations, these solutions are robust and reliable. Stringent semiconductor demands of shrinking feature size, increased contamina
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1bec62207e892fbf7d4bf01828c99c7e
https://doi.org/10.4028/www.scientific.net/ssp.219.28
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2
Indirect Ultra-Pure Water Metals Analysis by Extended Ion Exchange on a Silica Surface
Autor: Hai He Liang, Sasha Joseph Kweskin, Larry W. Shive, Alexis Grabbe
Publikováno v: Solid State Phenomena. 187:275-278
Water purity is not taken for granted in the Semiconductor Industry. Ultra high purity water (UPW) is analyzed continuously in-line for particles and resistivity. Routine samples are automatically taken for total organic carbon (TOC), boron, silica a
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ef14ef230fde150d1070308dca38a7d3
https://doi.org/10.4028/www.scientific.net/ssp.187.275
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3
Impact of Thermal Processing on Silicon Wafer Surface Roughness
Autor: Larry W. Shive, Brian L. Gilmore
Publikováno v: ECS Transactions. 16:401-405
Very flat silicon wafers with nanometer scale roughness are important during semiconductor device patterning onto the wafer. Recent reports have shown that thermal processing at high temperature in H2 or H2-Ar mixtures may be used to reduce roughness
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c8e646c935f2539e6654c5a85d2f5355
https://doi.org/10.1149/1.2982893
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5
Unintentional Doping of Wafers Due to Organophosphates in the Clean Room Ambient
Autor: E. J. Mori, J. B. Russell, W. C. McColgin, J. A. Lebens, L. W. Shive
Publikováno v: Journal of The Electrochemical Society. 143:2906-2909
We report here the unintentional doping of silicon device wafers during furnace operations caused by a volatile organophosphate contaminant in the clean room ambient. The unintentional doping is characterized electrically using spreading resistance a
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6511533d882e37f2c26d4e8651cd3697
https://doi.org/10.1149/1.1837125
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6
Oral treatment of transmissible gastroenteritis with natural human interferon alpha: A field study
Autor: Alan B. Richards, Joseph M. Cummins, David P. Hutcheson, Richard E. Mock, Steven Krakowka, Bradford W. Shive
Publikováno v: Veterinary Immunology and Immunopathology
During a natural outbreak of transmissible gastroenteritis (TGE), groups of piglets were treated orally for 4 consecutive days with placebo or 1.0, 10.0 or 20.0 international units (IU) natural human interferon alpha (nHuIFN alpha). Piglets that were
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::217ffbb60d5640cd91399ce41521e6b1
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