Zobrazeno 1 - 10
of 65
pro vyhledávání: '"Vratzov B"'
Autor:
Moonen, P.F., Vratzov, B., Smaal, W.T.T., Gelinck, G.H., Péter, M., Meinders, E.R., Huskens, J.
Publikováno v:
In Organic Electronics 2011 12(12):2207-2214
Publikováno v:
In Microelectronic Engineering 2004 73:167-171
Autor:
Henschel, W., Wahlbrink, T., Georgiev, Y.M., Lemme, M., Mollenhauer, T., Vratzov, B., Fuchs, A., Kurz, H., Kittler, M., Schwierz, F.
Publikováno v:
In Solid State Electronics 2004 48(5):739-745
Publikováno v:
In Microelectronic Engineering 2000 53(1):233-236
Publikováno v:
2016 International Workshop on EUV and Soft X-Ray Sources
Emission from extreme ultraviolet (EUV) light sources for lithography and metrology applications needs to be maximized in a narrow wavelength band. On the other hand, these sources also emit radiation outside this wavelength band, extending into the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::d31a8df0f239096ffaf9aac06d33fe05
https://research.utwente.nl/en/publications/1ed416d6-9766-4393-ba17-a4be3265aff8
https://research.utwente.nl/en/publications/1ed416d6-9766-4393-ba17-a4be3265aff8
Publikováno v:
2015 International Symposium on Extreme Ultraviolet Lithography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::4fac898baa0c78338e2170084dd09634
https://research.utwente.nl/en/publications/083a253b-0993-418c-84b3-295b820ac5d4
https://research.utwente.nl/en/publications/083a253b-0993-418c-84b3-295b820ac5d4
Autor:
Meer, R., Krishnan, B., Kozhevnikov, I. V., Boer, M. J., Vratzov, B., Bert Bastiaens, Jurriaan Huskens, Wilfred van der Wiel, Hegeman, P. E., Brons, G. C. S., Klaus-Jochen Boller, Bijkerk, F.
Publikováno v:
ISSUE=24;TITLE=24th NNV-Symposium Plasma Physics & Radiation Technology 2012
University of Twente Research Information (Pure Portal)
University of Twente Research Information (Pure Portal)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::4ee504b0225cf7cd884f3040ba925a0f
https://research.utwente.nl/en/publications/reduced-bandwidths-for-soft-xray-reflection-using-lamellar-multilayer-gratings(87adc7e3-27b3-471a-91df-bf7302a4e98d).html
https://research.utwente.nl/en/publications/reduced-bandwidths-for-soft-xray-reflection-using-lamellar-multilayer-gratings(87adc7e3-27b3-471a-91df-bf7302a4e98d).html
Autor:
Meer, R., Krishnan, B., Kozhevnikov, I. V., Vratzov, B., Bert Bastiaens, Jurriaan Huskens, Wilfred van der Wiel, Klaus-Jochen Boller, Frederik Bijkerk
Publikováno v:
ISSUE=22;TITLE=22nd NNV-Symposium on Plasma Physics & Radiation Technology 2010
University of Twente Research Information (Pure Portal)
University of Twente Research Information (Pure Portal)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::8a3a1af15b825ebb4a0911b492e8510d
https://research.utwente.nl/en/publications/3da56b49-d0a0-4e79-b798-8024e17c765e
https://research.utwente.nl/en/publications/3da56b49-d0a0-4e79-b798-8024e17c765e