Zobrazeno 1 - 10
of 47
pro vyhledávání: '"Vratislav Perina"'
Publikováno v:
Surface and Coatings Technology. 358:144-152
Corrosion behaviour of Ti-35Nb-7Zr-5Ta β titanium alloy nitrided by ion implantation was examined. Nitrogen ions were implanted with different fluences in the range from 1·1017 to 9·1017 cm−2 and an accelerating voltage of 90 kV. The specific ef
Publikováno v:
Progress in Organic Coatings. 119:85-90
© 2018 Elsevier B.V. Plasma-polymerized films of tetravinylsilane or its mixture with oxygen gas were deposited at low effective powers (0.1–10 W) using RF pulsed plasma. The Young's modulus and hardness of the plasma polymer films were characteri
Publikováno v:
Surface and Coatings Technology. 254:49-53
Complex film structures, such as multilayer and gradient films, were deposited using tetravinylsilane monomer by plasma-enhanced chemical vapor deposition. The optical and mechanical properties of the deposited film were controlled by the effective p
Autor:
Ondřej Caha, Petr Mikulík, S. Lichovnikova, Vladimir Cech, J. Zemek, R. Trivedi, Vratislav Perina
Publikováno v:
Surface and Coatings Technology. 205:S177-S181
As-deposited plasma polymer films of tetravinylsilane were modified by UV irradiation at ambient conditions. Surface and bulk spectroscopic techniques confirmed significant changes in chemical composition and structure that resulted in increased mech
Publikováno v:
Plasma Processes and Polymers. 5:745-752
Plasma-polymerized thin films of vinyltriethoxysilane were deposited on IR-transparent silicon wafers using plasma-enhanced chemical vapor deposition at a wide range of RF pulsed power (0.05-25 W). The deposited films were analyzed by various spectro
Publikováno v:
Plasma Processes and Polymers. 4:S776-S780
Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane to improve the compatibility of a-SiOC
Publikováno v:
Surface and Coatings Technology. 201:5512-5517
Plasma polymer films of tetravinylsilane were deposited on silicon wafers using an RF glow discharge operated in pulsed mode. Microscopic and spectroscopic techniques revealed that physico-chemical properties of plasma polymer depend on the effective
Autor:
Vratislav Perina, Anna Macková, Safa Kasap, Tomas Kohoutek, M. Frumar, V. Hnatowitz, Tomas Wagner, Jiri Orava, Mir. Vlček
Publikováno v:
Vacuum. 76:191-194
The Ag x (As 0,33 S 0,67 ) 100− x amorphous chalcogenide films were prepared by standard spin-coating techniques from their organic solution. The prepared films were stabilized in vacuum furnace at elevated temperatures. Composition and physico-che
Autor:
Anna Macková, Vratislav Perina, Pavlina Tresnakova-Nebolova, Jarmila Spirkova, Olga Telezhnikova, Vladimír Havránek
Publikováno v:
Surface Science. :111-114
We present the ion beam analytical technique (RBS, PIXE) characterization of erbium incorporation into the glass surface. In this paper we report on the characterization of our samples fabricated by medium temperature doping of erbium into the glass
Autor:
Jaroslav Pavlik, G. Borvon, Agnès Granier, M. Svec, Philippe Supiot, A. Quédé, Zdenek Stryhal, Patrice Raynaud, Vratislav Perina, Anna Macková
Publikováno v:
Surface Science. :1143-1146
Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour d