Zobrazeno 1 - 10 of 40 pro vyhledávání: '"Volintiru, I."'
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Akademický článek
In situ spectroscopic ellipsometry growth studies on the Al-doped ZnO films deposited by remote plasma-enhanced metalorganic chemical vapor deposition.
Autor: Volintiru, I., Creatore, M., van de Sanden, M. C. M.
Publikováno v: Journal of Applied Physics; Feb2008, Vol. 103 Issue 3, p033704, 10p, 1 Diagram, 3 Charts, 11 Graphs
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4
Akademický článek
Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition.
Autor: Volintiru, I., Creatore, M., Kniknie, B. J., Spee, C. I. M. A., van de Sanden, M. C. M.
Publikováno v: Journal of Applied Physics; 8/15/2007, Vol. 102 Issue 4, p043709, 9p, 1 Black and White Photograph, 2 Diagrams, 2 Charts, 7 Graphs
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5
Atmospheric pressure deposition of SnO2 and ZnO
Autor: Deelen, J. van, Kniknie, B.J., Grob, F.T.J., Volintiru, I., Roozeboom, F., Poodt, P.W.G., Illiberi, A.
Publikováno v: 38th IEEE Photovoltaic Specialists Conference, PVSC 2012, 3 June 2012 through 8 June 2012, Austin, TX, USA, 2014-2017
Transparent conductive oxide (TCO) coated glass is widely used in thin film PV. Atmospheric pressure chemical vapor deposition (APCVD) is a highly cost effective method of deposition and apart from metal precursor and oxygen precursor, other additive
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::84bf97b6155fa5fe117723eadbad89a7
http://resolver.tudelft.nl/uuid:8d87cdd3-b9d7-4a67-9079-ac4212088105
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6
The Development of High Performance TCO APCVD Processes for Photovoltaic Applications
Autor: Poodt, P., Van Deelen, J., Grob, F., Theelen, M., Winands, H., Volintiru, I., Van Mol, T., Spee, K., Kuypers, A.
24th European Photovoltaic Solar Energy Conference, 21-25 September 2009, Hamburg, Germany; 258-261
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD and plasma enhanced CVD processes for depos
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::72ffab3022162a70f7897925468eb6af
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7
Plasma enhanced chemical vapor deposition of ZnO : AI Iayers for thin film photovoltaics : control on the film growth
Autor: Creatore, M., Volintiru, I., Spee, C.I.M.A., Sanden, van de, M.C.M.
Publikováno v: Proceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts), 16-16
STARTPAGE=16;ENDPAGE=16;TITLE=Proceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts)
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::c58e8d02a7003928ec31275b4ae2f73c
https://research.tue.nl/nl/publications/d795717b-9721-4e26-9e9a-883826595596
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8
Remote plasma deposition of metal oxides : routes for controlling the film growth
Autor: Volintiru, I.
The second part of this thesis work was dedicated to extending the applicability of the ETP-MOCVD technique to obtain dense Al2O3 films at relatively low substrate temperatures (4% of the film thickness. By decreasing the pressure from 1.5 mbar to 0.
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::d1aaf82748ca95d39dfc1235133baff8
https://research.tue.nl/nl/publications/41ab8af1-6f08-41b7-b661-72631d734597
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9
Seebeck measurements as a powerful technique to characterize TCO materials
Autor: van Helvoort, W.H., Spee, C.I.M.A., Volintiru, I., Sanden, van de, M.C.M., Kuypers, A.D.
Publikováno v: Proceedings of the 1st International Symposium on Transparent Conductive Oxides, 23-25 October 2006, Heraklion, Crete, Greece, 204
ENDPAGE=204;TITLE=Proceedings of the 1st International Symposium on Transparent Conductive Oxides, 23-25 October 2006, Heraklion, Crete, Greece
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::a0184065f5541b20aaa9b4bcd666e0df
https://research.tue.nl/nl/publications/967b3811-a93c-4112-935e-537fff3ca17a
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10
Remote plasma deposition of inorganic films : the influence of plasma chemistry and ion bombardment on film growth and moisture permeation barrier performances
Autor: Creatore, M., Blauw, M.A., Hemmen, van, J.L., Volintiru, I., Koetse, M.M., Lohmann, V.I.T.A., Sanden, van de, M.C.M., Milella, A., Schoo, H.F.M.
Publikováno v: Proceedings of the 10th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany (Abstracts), 277-277
STARTPAGE=277;ENDPAGE=277;TITLE=Proceedings of the 10th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany (Abstracts)
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::686cccad6ed9a42edb6626c76b886f0d
https://research.tue.nl/nl/publications/c1243e54-151b-4c3c-ac4a-2b263807355b
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