Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Vojtech Svatos"'
Autor:
Vojtech Svatos, Daniel Dusek, Jaromir Zak, Jan Pekárek, Zdenek Hadas, Ludek Janak, Jaromir Hubalek, Jan Prasek
Publikováno v:
Microsystem Technologies. 22:1709-1719
An implant of artificial cochlea is the only way how to recover lost hearing in some cases. Fully implantable artificial cochlea in comparison with recent approaches including partially implantable devices is proposed and discussed in this work. The
Autor:
Vojtech Svatos, Daniel Dusek, Zdenek Hadas, Jan Prasek, Jan Pekárek, Jaromir Hubalek, Jaromir Zak
Publikováno v:
Procedia Engineering. 2016, vol. 168, issue 1, p. 1710-1713.
This work deals with the new technique called Charge Push-Through technology which is more energy efficient than the currently used approaches. The new energy efficient design regarding utilization of emerging technology such as Energy harvesting (EH
Autor:
Jaromir Hubalek, Imrich Gablech, Roman Prokop, Lukas Fujcik, Jan Pekárek, Michal Pavlik, Vojtech Svatos, Pavel Neuzil
Publikováno v:
Procedia Engineering. 2016, vol. 168, issue 1, p. 1007-1011.
This paper describes a self-compensating system for fixed pattern noise reduction (FPNR) of focal plane arrays (FPA) of infrared (IR) bolometer detectors. The proposed system used a ΔΣ modulator of first order which operates as non-saturating curre
Autor:
Vladimir Levek, Zdenek Pytlicek, Silvestr Vancik, Imrich Gablech, Vojtech Svatos, Jan Prasek, Jaroslav Klempa
Publikováno v:
2018 41st International Spring Seminar on Electronics Technology (ISSE).
In this paper, we design and develop low-power MEMS based microhotplates for chemiresistive gas sensors using computer modelling and microelectronic technologies, respectively. Two geometrical designs of supporting beams of suspended membranes were d
Autor:
Zdenek Hadas, Jaromir Hubalek, Jan Zak, Daniel Dusek, Jan Prasek, Vojtech Svatos, Jan Pekárek
Publikováno v:
Solid State Phenomena. :345-348
The paper presents the first results of research on an artificial cochlea based on a mechanical filter bank that could be produced by MEMS (Micro Electro Mechanical Systems) technologies and power supplied by energy harvesting systems. First, the bas
Autor:
Leonidas E. Ocola, Brian A. Bryce, B. R. Ilic, C. H. Ray, Meredith Metzler, James Alexander Liddle, Vojtech Svatos, Gregory Simelgor, David A. Czaplewski, G. Lopez, Richard Kasica, P. Neuzil, Marcelo Davanco, N. A. Bertrand, Christopher B. Wallin, Daron A. Westly, Ian Gilbert, Samuel M. Stavis, Krishna C. Balram, Qing Li, Thomas Michels, Slava Krylov, K. A. Dill, Juraj Topolancik, Vladimir A. Aksyuk, Karen E. Grutter, Yuxiang Liu, Kartik Srinivasan, Nicolae Lobontiu, Liya Yu
Publikováno v:
Conference on Lasers and Electro-Optics.
We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.
Publikováno v:
Applied Mechanics and Materials. :1602-1606
The fabrication of self-ordered semiconductor (TiO2) and noble metal (Au) QDs arrays was successfully achieved by advanced nonlithographic template based method, namely using nanoporous alumina template. The emphasis was placed on the successful prep
Autor:
Christopher H. Ray, Ian Gilbert, Kartik Srinivasan, David A. Czaplewski, Brian A. Bryce, Krishna C. Balram, Christopher B. Wallin, Meredith Metzler, Slava Krylov, Karen E. Grutter, Leonidas E. Ocola, Vladimir A. Aksyuk, Juraj Topolancik, Thomas Michels, Richard Kasica, Neal A. Bertrand, J. Alexander Liddle, Nicolae Lobontiu, Liya Yu, Marcelo Davanco, Gregory Simelgor, Yuxiang Liu, Gerald G. Lopez, Daron A. Westly, Samuel M. Stavis, Vojtech Svatos, Kristen A. Dill, B. Robert Ilic, Qing Li, Pavel Neuzil
Publikováno v:
J Res Natl Inst Stand Technol
Balram, K C, Westly, D A, Davanço, M, Grutter, K E, Li, Q, Michels, T, Ray, C H, Yu, L, Kasica, R J, Wallin, C B, Gilbert, I J, Bryce, B A, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, K A, Bertrand, N A, Metzler, M G, Lopez, G, Czaplewski, D A, Ocola, L, Srinivasan, K A, Stavis, S M, Aksyuk, V A, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, ' The Nanolithography Toolbox ', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475 . https://doi.org/10.6028/jres.121.024
Balram, K C, Westly, D A, Davanço, M, Grutter, K E, Li, Q, Michels, T, Ray, C H, Yu, L, Kasica, R J, Wallin, C B, Gilbert, I J, Bryce, B A, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, K A, Bertrand, N A, Metzler, M G, Lopez, G, Czaplewski, D A, Ocola, L, Srinivasan, K A, Stavis, S M, Aksyuk, V A, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, ' The Nanolithography Toolbox ', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475 . https://doi.org/10.6028/jres.121.024
This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Stan
Autor:
Robert R. Ilic, Krishna Coimbatore Balram, Daron A. Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Liya Yu, Neal A. Bertrand, Samuel M. Stavis, Vladimir A. Aksyuk, James Alexander A. Liddle, Brian A. Bryce, Nicolae Lobontiu, Yuxiang Liu, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Pavel Neuzil, Vojtech Svatos, Slava Krylov, Christopher B. Wallin, Ian J. Gilbert, Kristen A. Dill, Richard J. Kasica, Kartik A. Srinivasan, Gregory Simelgor, Juraj Topolancik
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d6f791326e285fe0a44b8bce511827c
https://doi.org/10.6028/nist.hb.160
https://doi.org/10.6028/nist.hb.160
Publikováno v:
Key Engineering Materials. :457-460
The article deals with photo-reflective layer on Low Temperature Co-fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned.