Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Vladimir Faifer"'
Publikováno v:
ECS Transactions. 13:37-43
A non-contact method for measurement of sheet resistance and leakage current (RsL) for ultra-shallow junction characterization is described where high-density (30,000 pixel) sheet resistance maps provide detailed evaluation of local and global variat
Publikováno v:
ECS Transactions. 11:135-147
A non-contact method for measurement of sheet resistance and leakage current (RsL) for ultra-shallow junction (USJ) characterization is described based on analysis of frequency-dependent junction photovoltages from p-n junctions . Theoretical, device
Publikováno v:
2011 37th IEEE Photovoltaic Specialists Conference.
Thin film photovoltaics, such as those based on CdTe and CIGS, exhibit both intentional and unintentional spatial variations in electronic properties which can have a profound impact on device performance. Here, we expand upon the techniques of elect
Autor:
Jeffri Halim, Akira Mineji, Vladimir Faifer, Michael Current, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko
Publikováno v:
AIP Conference Proceedings.
High spatial resolution sheet resistance measurements, based on analysis of junction photo‐voltage (JPV) signals, are used to reveal subtle dose uniformity variations for 40 and 90 keV Boron implants in the dose range of 1011 B/cm2. The use of vari
Autor:
Robert J. Hillard, Alain Moussa, Rong Lin, Vladimir Faifer, Trudo Clarysse, Dirch Hjorth Petersen, M. C. Benjamin, Roger Loo, Michael I. Current, Frederik Leys, Wilfried Vandervorst
Publikováno v:
MRS Proceedings. 912
Comparison of state-of-the-art zero-penetration sheet resistance tools on ultra-shallow Boron CVD layers on top of a medium doped As layer.
Publikováno v:
MRS Proceedings. 945
A non-contact metrology for electrical char acterization of p-n junctions has been developed for use on photo-voltaic materials. By analysis of junction photo-voltage (JPV) measurements at multiple light beam modulation frequencies and multiple light
Autor:
Dale C. Jacobson, Julien Venturini, Wade A. Krull, M. C. Benjamin, Michael I. Current, Akira Mineji, Jeff Gelpey, Vladimir Faifer, James T. C. Chen, S. McCoy, Tom Walker, Zhiqiang Li, Silke Paul, Masayasu Tanjyo, Robert J. Hillard, John Borland, Wilfried Lerch, Seiichi Shishiguchi, Andrzej Buczkowski
Publikováno v:
AIP Conference Proceedings.
High dopant activation and low damage p+ ultra‐shallow junctions (USJ) 15–20nm deep for 45nm node applications have been realized using B10H14 & B18H22 implant species along with flash, laser or SPE diffusion‐less activation annealing technique
Autor:
Tan Nguyen, S. H. Lau, Vitali Souchkov, Ann Koo, Georgy Mikhaylov, Vladimir Faifer, Phuc Van, Jiansong Lu, Tim Wong, Michael I. Current, Wojciech J. Walecki
Publikováno v:
MRS Proceedings. 810
A novel, non-contact method for determination of ultra-shallow junction sheet resistance and leakage current density has been developed based on monitoring the dynamics of photo-generated carriers by means of spatially separated capacitive probes. At
Publikováno v:
Journal of Applied Physics. 108:074516
Equations describing the effect of electronic nonuniformities on electroluminescence (EL) and electron beam induced current (EBIC) images are derived and tested on Cu(In,Ga)Se2 solar cells. EL images are sensitive to fluctuations in band gap and carr
Publikováno v:
Applied Physics Letters. 96:222102
Equations describing the electroluminescence (EL) intensity as a function of material properties are derived for thin film solar cells and experimentally validated using Cu(In,Ga)Se2 solar cells. EL intensity at constant voltage is controlled by the