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Autor:
Maxim V. Bolshakov, Waleri Imgrunt, Lutz Aschke, Victor A. Soifer, Vladimir S. Pavelyev, Yuri V. Miklyaev, Denis G. Kachalov, Vitaly Lissotschenko
Optical lithography with its 193nm technology is pushed to reach and shift its limits even further. There is strong demand on innovations in illumination part of exposure tools. Current illumination systems consisting of diffractive and refractive op
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f838611a82873ec36044bd5dea6b2808
http://dspace.susu.ru/handle/0001.74/20499
http://dspace.susu.ru/handle/0001.74/20499
