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Autor:
Douglas Guerrero, Glenn Dado, Virgil Briggs, Shyam Paudel, Nick Brakensiek, Levi Gildehaus, Tim Limmer, Michael Mesawich, Vineet Alexander, Mona Bavarian, Rao Varanasi, Lucia D'Urzo
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
The silicon hardmask (Si-HM) is one of the key materials used in multilayer lithography for pattern transfer to a substrate using a fluorinated plasma etching process. Manufacturing of devices with smaller feature sizes introduces new challenges in d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0383a4791dd44cd6e3a580d5be785fdf
https://doi.org/10.1117/12.2552833
https://doi.org/10.1117/12.2552833
