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Autor:
Labrini Sygellou, Spyridon Ladas, S. Kennou, Christoforos A. Krontiras, Violeta Gianneta, D. Skarlatos, N. Xanthopoulos, Stavroula N. Georga
Publikováno v:
Surface Science Spectra. 18:58-67
Thin films of aluminium oxide (Al2O3) and zirconium oxide (ZrO2) were prepared by Atomic Layer Deposition (ALD) on p-type (100) germanium substrates. In the present work a detailed analysis of the films by X-ray photoelectron spectroscopy (XPS) in or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a0b86dcb1ae2e388a924d3d33e7fd96
https://doi.org/10.1116/11.20100901
https://doi.org/10.1116/11.20100901
