Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures

Autor: Sarah Goler 1, 2, Vincenzo Piazza 2, Stefano Roddaro 1, Vittorio Pellegrini 1, Fabio Beltram 1, Pasqualantonio Pingue 1

Publikováno v: Journal of applied physics 110 (2011): 064308–064313. doi:10.1063/1.3633260
info:cnr-pdr/source/autori:Sarah Goler 1,2, Vincenzo Piazza 2, Stefano Roddaro 1, Vittorio Pellegrini 1, Fabio Beltram 1,2, and Pasqualantonio Pingue 1/titolo:Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures/doi:10.1063%2F1.3633260/rivista:Journal of applied physics/anno:2011/pagina_da:064308/pagina_a:064313/intervallo_pagine:064308–064313/volume:110

We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free de

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