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pro vyhledávání: '"Vincent Korthuis"'
Publikováno v:
Handbook of Semiconductor Manufacturing Technology ISBN: 9781315213934
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5b22cbc0ed7800858f4ed876aa3429a
https://doi.org/10.1201/9781420017663-17
https://doi.org/10.1201/9781420017663-17
Autor:
Gregory B. Shinn, Christopher L. Borst, Vincent Korthuis, William N. Gill, Ronald J. Gutmann, J.D. Luttmer
Publikováno v:
Thin Solid Films. 385:281-292
The effects of slurry chemistry and film properties on the chemical–mechanical polishing (CMP) of three organosilicate glasses (SiOC) were used to develop an understanding of the removal mechanism during SiOC CMP. The SiOC removal rate varied from