Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Vincent Arnoux"'
Autor:
Philippe Hurat, Ya-Chieh Lai, Ryoung-han Kim, Jun Ye, Cyrus E. Tabery, Yi Zou, Vincent Arnoux, Michel Luc Cote, Luca Mattii, Praveen Raghavan
Publikováno v:
Optical Microlithography XXX.
Publisher’s Note: This paper, originally published on 30-March, 2017, was replaced with a corrected/revised version on 6-April, 2017. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Cust
Autor:
Shuichiro Ohara, Dai Tsunoda, Brian Dillon, Masakazu Hamaji, Vincent Arnoux, Yi-Hsing Peng, Stanislas Baron, Yi Zou, Tomoyuki Muramatsu, Xiaolong Zhang
Publikováno v:
SPIE Proceedings.
Demand for mask process correction (MPC) is growing for leading-edge process nodes. MPC was originally intended to correct CD linearity for narrow assist features difficult to resolve on a photomask without any correction, but it has been extended to