Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Vinay Chikarmane"'
Publikováno v:
Journal of Electronic Materials. 23:1261-1268
In this paper, we present electrical and material properties of thin films (100 to 400 nm) of magnetron-sputtered ferroelectric PZT for memory applications. The optimal lead-compensation power (and the resulting film composition) is independent of fi
Publikováno v:
Integrated Ferroelectrics. 3:113-120
A low thermal budget (with 550°C annealing) process with Ti-compensation for sputtered ferroelectric PZT thin films has been developed. PZT films with a composition near the morphotrophic phase boundary (Zr/Ti = 53/47) annealed at 550°C for 1 hr in
Publikováno v:
MRS Online Proceedings Library. 265:313-318
The origin and the effects of asymmetrical electrical behavior in sputtered PZT (Zr/Ti=65/35) thin film capacitors with Pt electrodes have been studied. The asymmetry and constriction in the P-E hysteresis loops are understood to result from differen
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:1562-1568
The fabrication of high dielectric constant lead zirconate titanate thin films for dynamic random access memory application involves post‐deposition annealing to convert the low dielectric constant pyrochlore phase to the desired high dielectric co
Publikováno v:
Journal of Electronic Materials. 21:503-512
Thin film capacitors of Lead Zirconate Titanate (PZT, 400 nm) of Zr/Ti ratio 65/35, deposited by reactive dc-magnetron sputtering, with low leakage current and high charge storge density(’Qc) for use as capacitor dielectrics in ultra-large scale in
Publikováno v:
Applied Physics Letters. 59:2850-2852
Lead zirconate titanate [PZT, Pb(ZrxTi1−x)O3, x=0.65, 400 nm] thin-film capacitors with very low leakage current and large stored charge densities (Q′c=Pmax–Pr) for ultralarge scale integration dynamic random access memory (ULSI DRAM) memory ap
Publikováno v:
MRS Proceedings. 243
The Pt-Lead Zirconate Titanate (PZT) thin film interface plays a key role in determining the electrical properties and phase transformation kinetics of Pt-PZT-Pt thin film capacitor structures. The results of the electrical and material properties of
Publikováno v:
MRS Proceedings. 230
The feasibility of the fabrication of thin film capacitors of Lead Zirconate Titanate (PZT) by reactive DC-Magnetron sputtering, with large switched charge and low leakage current densities for ultra-large scale integration Dynamic Random Access Memo
Publikováno v:
IEEE transactions on ultrasonics, ferroelectrics, and frequency control. 38(6)
The electrical and reliability characteristics of ferroelectric capacitors fabricated using sol-gel derived 50/50 lead-zirconate-titanate (PZT) thin films have been examined for ULSI DRAM (dynamic random access memory) applications. Various electrode
Autor:
J.C. Lee, C. Sudhama, Al F. Tasch, L. H. Parker, Vinay Chikarmane, William H. Shepherd, W. Miller, N. Abt, J. Carrano
Publikováno v:
MRS Proceedings. 200
This paper investigates the issues in the scaling of thin film PZT (Lead-Zirconate-Titanate) capacitors for DRAM (Dynamic Random Access Memories) applications. The test structures used were MIM (metal-insulator-metal) capacitors with platinum electro