Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Viktor Kanarov"'
Autor:
V. Novotny, A. Rukavishnikov, Viktor Kanarov, Y. Yevtukhov, V.I. Polyakov, I. Zaritsky, Boris L. Druz
Publikováno v:
Diamond and Related Materials. 9:668-674
Nitrogenated carbon films were deposited on various substrates using filtered cathodic arc. Non-uniformity of the film thickness was less than 5% over a 15 cm diameter area. Mechanical, optical (refraction index, extinction coefficient versus wavelen
Autor:
W. Cheesman, H. Hegde, Viktor Kanarov, D. Yakovlevitch, V. Mirkov, B. Druz, A. V. Hayes, R. Yevtukhov
Publikováno v:
Review of Scientific Instruments. 71:1163-1167
A rf inductively coupled ion source employing a novel electrode assembly for focusing a broad ion beam on a relatively small target area was developed. The primary application of this ion source is the deposition of thin films used in the fabrication
Autor:
A.I. Rukovishnikov, E. Ostan, Alan V. Hayes, Boris L. Druz, S. DiStefano, Viktor Kanarov, N.M. Rossukanyi, A.V. Khomich, V.I. Polyakov
Publikováno v:
Diamond and Related Materials. 7:965-972
Diamond-like carbon (DLC) films with 12–25 GPa hardnesses and 3–400 nm thicknesses were deposited on silicon, Al2O3-TiC substrates, and permalloy coated with Al2O3-TiC substrates using a broad, uniform ion beam from an RF, inductively coupled, CH
Autor:
R. Yevtukov, Hari Hegde, M. S. Miller, Jinsong Wang, Adrian J. Devasahayam, Ming Mao, Viktor Kanarov, Richard J. Gambino, Alan V. Hayes
Publikováno v:
Journal of Applied Physics. 85:4922-4924
Spin–valve films with the structure Ta/NiFe/FeCo/Cu(18–30 A)/FeCo/FeMn–70 A/Ta were deposited using a Veeco ion beam deposition (IBD) system, model IBD-350. The physical properties of these spin–valve films as a function of primary ion beam e
Publikováno v:
Review of Scientific Instruments. 69:874-876
A 35 cm diam inductively coupled rf ion source and its applications for material processing is described. This is the largest commercial rf ion-beam source presently available for ion-beam etching and deposition. It has been used to generate beams of
Publikováno v:
Review of Scientific Instruments. 79:093304
Characterization of the ion energy distribution function (IEDF) of low energy high current density ion beams by conventional retarding field and deflection type energy analyzers is limited due to finite ion beam emittance and beam space charge spread
Publikováno v:
Review of Scientific Instruments. 77:03B515
In accordance with advanced data storage device fabrication requirements, we have evaluated a new broad-beam rf ion source for ion beam etching and deposition application. This source utilizes a novel reentrant shaped plasma inductively coupled plasm
Autor:
Steve Bozeman, Viktor Kanarov, Ned Tabat, Rustam Yevtukhov, Jinsong Wang, Patrick J. Ryan, Paul E. Anderson, Alan V. Hayes, Hari Hegde, Adrian J. Devasahayam
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17:2186
Thin film permanent magnet layers of Cr/CoCrPt were prepared by ion beam deposition in a Veeco IBD-350 tool. The magnetic properties were measured as a function of deposition angle, deposition energy, assist energy, and the underlayer and permanent m