Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Vikram Thapar"'
Autor:
Robert M. Jacobberger, Vikram Thapar, Guang-Peng Wu, Tzu-Hsuan Chang, Vivek Saraswat, Austin J. Way, Katherine R. Jinkins, Zhenqiang Ma, Paul F. Nealey, Su-Mi Hur, Shisheng Xiong, Michael S. Arnold
Publikováno v:
Nature Communications, Vol 11, Iss 1, Pp 1-10 (2020)
Directing the position, orientation, and long-range lateral order of block copolymer domains to produce technologically-useful, sublithographic patterns is a challenge. Here, the authors present a promising approach to overcome the challenge by direc
Externí odkaz:
https://doaj.org/article/3052fb13b2e2403e9e6b27014a696eab
Autor:
Bi-Xian Wu, Jing Zhou, Tzu-Hsuan Chang, Vikram Thapar, Paul F. Nealey, Yu Chen, Gordon S. W. Craig, Shisheng Xiong, Su-Mi Hur
Publikováno v:
ACS Applied Materials & Interfaces. 13:41190-41199
Directed self-assembly (DSA) of block copolymers is one of the most promising patterning techniques for patterning sub-10 nm features. However, at such small feature sizes, it is becoming increasingly difficult to fabricate the guiding pattern for th
Publikováno v:
Molecular Systems Design & Engineering. 6:1087-1097
Block copolymer brushes where chains are grafted onto the substrate have been of special interest due to their capability to form various self-assembled nanoscale structures. The self-assembled structures depend on complex system variables, including
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 20
Background: Finding optimal processing conditions to reduce defectivity is a major challenge in high-resolution lithographic tools such as directed self-assembly and extreme ultraviolet lithography. Aim: We aim to develop an efficient automated metho
Autor:
Jing, Zhou, Vikram, Thapar, Yu, Chen, Bi-Xian, Wu, Gordon S W, Craig, Paul F, Nealey, Su-Mi, Hur, Tzu-Hsuan, Chang, Shisheng, Xiong
Publikováno v:
ACS applied materialsinterfaces. 13(34)
Directed self-assembly (DSA) of block copolymers is one of the most promising patterning techniques for patterning sub-10 nm features. However, at such small feature sizes, it is becoming increasingly difficult to fabricate the guiding pattern for th
Publikováno v:
Polymers
Polymers, Vol 13, Iss 953, p 953 (2021)
Volume 13
Issue 6
Polymers, Vol 13, Iss 953, p 953 (2021)
Volume 13
Issue 6
Coarse-grained modeling is an outcome of scientific endeavors to address the broad spectrum of time and length scales encountered in polymer systems. However, providing a faithful structural and dynamic characterization/description is challenging for
Autor:
Zhenqiang Ma, Paul F. Nealey, Guang-Peng Wu, Shisheng Xiong, Tzu-Hsuan Chang, Vivek Saraswat, Austin J. Way, Katherine R. Jinkins, Michael S. Arnold, Su-Mi Hur, Robert M. Jacobberger, Vikram Thapar
Publikováno v:
Nature Communications
Nature Communications, Vol 11, Iss 1, Pp 1-10 (2020)
Nature Communications, Vol 11, Iss 1, Pp 1-10 (2020)
Directed self-assembly of block copolymers (BCPs) enables nanofabrication at sub-10 nm dimensions, beyond the resolution of conventional lithography. However, directing the position, orientation, and long-range lateral order of BCP domains to produce
Publikováno v:
ACS Nano. 12:9974-9981
Defects in highly ordered self-assembled block copolymers represent an important roadblock toward the adoption of these materials in a wide range of applications. This work examines the pathways for annihilation of defects in symmetric diblock copoly
Publikováno v:
Soft Matter. 14:1996-2005
The nucleation of ordered phases from the bulk isotropic phase of octahedron-like particles has been studied via Monte Carlo simulations and umbrella sampling. In particular, selected shapes that form ordered (plastic) phases with various symmetries
Publikováno v:
Molecular Systems Design & Engineering; Dec2021, Vol. 6 Issue 12, p1087-1097, 11p