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pro vyhledávání: '"Victor Katsap"'
Autor:
Victor Katsap
Publikováno v:
Journal of Vacuum Science & Technology B. 41:010602
Kikuchi lines, known since 1928 [S. Kikuchi, Jpn. J. Phys. 5, 83 (1928)], are generated by irradiating a crystal with high-energy e-beam in SEM or TEM and observing backscattered electrons diffraction on crystalline planes. The Kikuchi line effect ga
Autor:
Victor Katsap, Chising Lai
Publikováno v:
2019 International Vacuum Electronics Conference (IVEC).
LaB6 cathode is the emitter of choice in electron beam lithography tools. We have devised and implemented simple, robust technique for evaluating LaB6 cathode workfunction (WF), and studied workfunction-operating temperature relationship.
Autor:
Victor Katsap
Publikováno v:
2017 Eighteenth International Vacuum Electronics Conference (IVEC).
It has been shown, theoretically and experimentally, that miniature emitter located on conductive plane would have loading higher than predicted by “three-halves law”, and its emission profile would be that of “inverted Gaussian”, i.e. emissi
Autor:
Chising Lai, Victor Katsap
Publikováno v:
2017 Eighteenth International Vacuum Electronics Conference (IVEC).
Several dispenser cathodes with microscopic emissive area, including ones with anti-emissive coating, have been tested for application in e-beam lithography tools. Major requirements were high loading, >15 A/sq.cm, and uniform profile of the emitted
Autor:
Victor Katsap
Publikováno v:
2016 IEEE International Vacuum Electronics Conference (IVEC).
binary rare-earth lanthanum hexaborides LaB6 and CeB6 have been successfully used in specialty electron guns, such as e-beam lithography systems, for over two decades. During this time, there were a few papers suggesting ternary compound crystal ReB6
Autor:
Chising Lai, Victor Katsap
Publikováno v:
2015 IEEE International Vacuum Electronics Conference (IVEC).
LaB 6 cathode is the emitter of choice in electron beam lithography tools. In commercial LaB 6 cathodes, the (100) crystalline plane is used as the emissive surface. Typical size of emitter is ∼70 µm DIA. Quality control is usually done by observi
Autor:
Takahito Nakayama, Noriaki Nakayamada, Kenji Ohtoshi, Victor Katsap, Rodney A. Kendall, Hidekazu Takekoshi, Seiichi Nakazawa, Hiroyoshi Ando, Kenichi Saito, Hideo Inoue, Tomohiro Iijima, Akihito Anpo, Yoshinori Kojima, Hirohito Anze, Rieko Nishimura, Takashi Kamikubo, Steven D. Golladay, Jun Yashima
Publikováno v:
SPIE Proceedings.
Many lithography candidates, such as ArF immersion lithography with double-patterning/double-exposure techniques, EUV lithography and nano-imprint lithography, show promising capability for 22-nm half-pitch generation lithography. ArF immersion litho
Autor:
Masis Mkrtchyan, Victor Katsap, Stuart T. Stanton, Warren K. Waskiewicz, Reginald C. Farrow, Eric Munro, James Alexander Liddle
Publikováno v:
Microelectronic Engineering. 53:299-302
The global space charge (SC) effect in SCALPEL electron beam lithography system is investigated. First order properties of the SC lensing action (defocus and magnification change) in SCALPEL type projection systems are analyzed using a simple analyti
Autor:
Victor Katsap
Publikováno v:
2013 IEEE 14th International Vacuum Electronics Conference (IVEC).
LaB6 cathode is the emitter of choice in electron beam lithography tools. In commercial LaB6 cathodes, the (100) crystalline plane is used as the emissive surface. Values of (100) and surrounding crystalline planes workfunction (WF) vary widely in li
Publikováno v:
IVEC 2012.
Boersch, or stochastic space charge effect, is the effect of broadening of the e-beam axial energy spectrum. It limits reso lution of fine electron optics by means of change in axial velocity of electrons. This is caused by a stochastic, discrete el