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pro vyhledávání: '"Victor Katsap"'
Autor:
Victor Katsap
Publikováno v:
Journal of Vacuum Science & Technology B. 41:010602
Kikuchi lines, known since 1928 [S. Kikuchi, Jpn. J. Phys. 5, 83 (1928)], are generated by irradiating a crystal with high-energy e-beam in SEM or TEM and observing backscattered electrons diffraction on crystalline planes. The Kikuchi line effect ga
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86910dca457adc77e4f68179230a2610
https://doi.org/10.1116/6.0002375
https://doi.org/10.1116/6.0002375
Autor:
Victor Katsap, Chising Lai
Publikováno v:
2019 International Vacuum Electronics Conference (IVEC).
LaB6 cathode is the emitter of choice in electron beam lithography tools. We have devised and implemented simple, robust technique for evaluating LaB6 cathode workfunction (WF), and studied workfunction-operating temperature relationship.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef5ccc11ecb80c8d77709e40b977cce7
https://doi.org/10.1109/ivec.2019.8745230
https://doi.org/10.1109/ivec.2019.8745230
Autor:
Victor Katsap
Publikováno v:
2017 Eighteenth International Vacuum Electronics Conference (IVEC).
It has been shown, theoretically and experimentally, that miniature emitter located on conductive plane would have loading higher than predicted by “three-halves law”, and its emission profile would be that of “inverted Gaussian”, i.e. emissi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86ebf504e7637aec0431d5429f610943
https://doi.org/10.1109/ivec.2017.8289733
https://doi.org/10.1109/ivec.2017.8289733
Autor:
Chising Lai, Victor Katsap
Publikováno v:
2017 Eighteenth International Vacuum Electronics Conference (IVEC).
Several dispenser cathodes with microscopic emissive area, including ones with anti-emissive coating, have been tested for application in e-beam lithography tools. Major requirements were high loading, >15 A/sq.cm, and uniform profile of the emitted
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77a3efc6f97f34479eaa139ef856b158
https://doi.org/10.1109/ivec.2017.8289740
https://doi.org/10.1109/ivec.2017.8289740
Autor:
Victor Katsap
Publikováno v:
2016 IEEE International Vacuum Electronics Conference (IVEC).
binary rare-earth lanthanum hexaborides LaB6 and CeB6 have been successfully used in specialty electron guns, such as e-beam lithography systems, for over two decades. During this time, there were a few papers suggesting ternary compound crystal ReB6
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18a1218100ba28b1831c8539c00f9265
https://doi.org/10.1109/ivec.2016.7561780
https://doi.org/10.1109/ivec.2016.7561780
Autor:
Chising Lai, Victor Katsap
Publikováno v:
2015 IEEE International Vacuum Electronics Conference (IVEC).
LaB 6 cathode is the emitter of choice in electron beam lithography tools. In commercial LaB 6 cathodes, the (100) crystalline plane is used as the emissive surface. Typical size of emitter is ∼70 µm DIA. Quality control is usually done by observi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::867d0e533031098f79b05e04fdcd2520
https://doi.org/10.1109/ivec.2015.7223744
https://doi.org/10.1109/ivec.2015.7223744
Autor:
Takahito Nakayama, Noriaki Nakayamada, Kenji Ohtoshi, Victor Katsap, Rodney A. Kendall, Hidekazu Takekoshi, Seiichi Nakazawa, Hiroyoshi Ando, Kenichi Saito, Hideo Inoue, Tomohiro Iijima, Akihito Anpo, Yoshinori Kojima, Hirohito Anze, Rieko Nishimura, Takashi Kamikubo, Steven D. Golladay, Jun Yashima
Publikováno v:
SPIE Proceedings.
Many lithography candidates, such as ArF immersion lithography with double-patterning/double-exposure techniques, EUV lithography and nano-imprint lithography, show promising capability for 22-nm half-pitch generation lithography. ArF immersion litho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8d42d9388e3cf893d9c60ad2918c5138
https://doi.org/10.1117/12.2065551
https://doi.org/10.1117/12.2065551
Autor:
Masis Mkrtchyan, Victor Katsap, Stuart T. Stanton, Warren K. Waskiewicz, Reginald C. Farrow, Eric Munro, James Alexander Liddle
Publikováno v:
Microelectronic Engineering. 53:299-302
The global space charge (SC) effect in SCALPEL electron beam lithography system is investigated. First order properties of the SC lensing action (defocus and magnification change) in SCALPEL type projection systems are analyzed using a simple analyti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c2edf47eb114515d006756bc938a05b
https://doi.org/10.1016/s0167-9317(00)00319-1
https://doi.org/10.1016/s0167-9317(00)00319-1
Autor:
Victor Katsap
Publikováno v:
2013 IEEE 14th International Vacuum Electronics Conference (IVEC).
LaB6 cathode is the emitter of choice in electron beam lithography tools. In commercial LaB6 cathodes, the (100) crystalline plane is used as the emissive surface. Values of (100) and surrounding crystalline planes workfunction (WF) vary widely in li
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2370de396557829ecb8a5bb4fc83c96b
https://doi.org/10.1109/ivec.2013.6570897
https://doi.org/10.1109/ivec.2013.6570897
Publikováno v:
IVEC 2012.
Boersch, or stochastic space charge effect, is the effect of broadening of the e-beam axial energy spectrum. It limits reso lution of fine electron optics by means of change in axial velocity of electrons. This is caused by a stochastic, discrete el
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ff8b846ccd8ddf469fab41e0543e491
https://doi.org/10.1109/ivec.2012.6262203
https://doi.org/10.1109/ivec.2012.6262203