Zobrazeno 1 - 3 of 3 pro vyhledávání: '"Vianney Koelman"'
1
Tin deposition on ruthenium and its influence on blistering in multi-layer mirrors
Autor: Shuxia Tao, Vianney Koelman, Geert Brocks, Thomas Morgan, Chidozie Onwudinanti
Publikováno v: Physical Chemistry Chemical Physics, 23, 13878-13884
Physical Chemistry Chemical Physics
Physical Chemistry Chemical Physics, 23(25), 13878-13884. Royal Society of Chemistry
Physical chemistry chemical physics, 23(25), 13878-13884. Royal Society of Chemistry
An atomistic description of tin deposition on ruthenium and its effect on blistering damage is of great interest in extreme ultraviolet (EUV) lithography. In EUV machines, tin debris from the EUV-emitting tin plasma may be deposited on the mirrors in
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::acbf609b97b770158cef08b8936a82c6
https://doi.org/10.1039/d1cp01082d
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2
Hydrogen diffusion out of ruthenium - an ab initio study of the role of adsorbates
Autor: Chidozie Onwudinanti, Geert Brocks, T. W. Morgan, Vianney Koelman, Shuxia Tao
Publikováno v: Physical chemistry chemical physics, 22(15), 7935-7941. Royal Society of Chemistry
Physical Chemistry Chemical Physics, 22, 7935-7941
Physical Chemistry Chemical Physics, 22(15), 7935-7941. Royal Society of Chemistry
Hydrogen permeation into mirrors used in extreme ultraviolet lithography results in the formation of blisters, which are detrimental to reflectivity. An understanding of the mechanism via which hydrogen ends up at the interface between the top ruthen
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dee84bc3202b397373fba1c096b98d86
https://research.utwente.nl/en/publications/39b611ad-1d0f-4a09-9be8-9d4720ca26d6
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