28 nm FD-SOI MEOL parasitic capacitance segmentation using electrical testing and semiconductor process modeling

Autor: Vianne, B., Guillo-Lohan, B., Quenette, V., Legoix, B., Vincent, B.

Publikováno v: In Solid State Electronics February 2023 200

Temperature dependency of the strain distribution induced by TSVs in silicon: A comparative study between micro-Laue and monochromatic nano-diffraction

Autor: Vianne, B., Escoubas, S., Krauss, C., Richard, M.-I., Labat, S., Chahine, G., Micha, J.-S., Schülli, T., Fiori, V., Farcy, A., Thomas, O.

Publikováno v: In Microelectronic Engineering 20 April 2016 156:59-64

CLIENTS' PREFERENCE FOR LOW-COST RESIDENTIAL PROPERTIES: A CONJOINT ANALYSIS

Autor: John Vianne B. Murcia, Loweeh M. Matillano

Publikováno v: European Journal of Management and Marketing Studies. 7

The purpose of this study was to determine the clients’ preference for residential property in Digos City in the southern part of the Philippines. Through the examination of the five attributes (location, equity, terms of payment, floor area, and t

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bc0246dbd4515ae6aa4ec416ed5a778a
https://doi.org/10.46827/ejmms.v7i4.1387

Estimating the technical efficiency of Cutflower farms

Autor: Kristine Joyce P. Betonio, Nikki Marie T. Cugat, Alessa R. Indanan, Ojela Mae M. Entero, John Vianne B. Murcia

Publikováno v: University of Mindanao International Multidisciplinary Research Journal, Vol 1, Iss 2, Pp 44-55 (2016)

This study sought to estimate the technical efficiency of cutflower farms and determine the sources of inefficiency among the farmers. In order to do so, the study had two phases: Phase 1 measured the technical efficiency scores of cutflower farms us

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doajarticles::75baf4a4fe49f6cb572bd42266fb20d7
http://umindanao.edu.ph/journal/wp-content/uploads/2017/01/Estimating-the-technical-efficiency-of-Cutflower-farms2.pdf

Effect of the temperature on the strain distribution induced in SOI photonic substrate by copper filled TSVs, using advanced scanning X-ray nano- diffraction

Autor: Vianne, B., Escoubas, S., Richard, M.I., Fiori, V., Farcy, A., Thomas, O.

Publikováno v: 14th International Conference Reliability and Stress-Related Phenomena in Nanoelectronics–Experiment and Simulation
14th International Conference Reliability and Stress-Related Phenomena in Nanoelectronics–Experiment and Simulation, May 2016, Dresden, Germany

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::66b5c93749dde6c5a98614298490214f
https://hal-amu.archives-ouvertes.fr/hal-01454838