Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Veronica Tiba"'
Autor:
Florian Werner, Fred Roozeboom, Jan Schmidt, Paul Poodt, Rolf Brendel, Boris Veith, Veronica Tiba
Publikováno v:
Applied Physics Letters, 16, 97
Applied Physics Letters, 97(16):162103, 162103-1/3. American Institute of Physics
Applied Physics Letters, 97(16):162103, 162103-1/3. American Institute of Physics
Using aluminum oxide (Al2 O3) films deposited by high-rate spatial atomic layer deposition (ALD), we achieve very low surface recombination velocities of 6.5 cm/s on p -type and 8.1 cm/s on n -type crystalline silicon wafers. Using spatially separate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9b56635c417f9c4310228efa10f69b31
http://resolver.tudelft.nl/uuid:03adddf4-f411-48fe-b3f8-d72005623388
http://resolver.tudelft.nl/uuid:03adddf4-f411-48fe-b3f8-d72005623388
Autor:
A. M. Lankhorst, Fred Roozeboom, Paul Poodt, Ad Vermeer, Veronica Tiba, D. Diederik Maas, Karel Spee
Publikováno v:
6th Symposium on Atomic Layer Deposition Applications-218th ECS Meeting, 10 October 2010 through 15 October 2010, Las Vegas, NV, USA. Conference code: 84178, 2, 33, 419-427
Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA, 419-427
STARTPAGE=419;ENDPAGE=427;TITLE=Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA
Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA, 419-427
STARTPAGE=419;ENDPAGE=427;TITLE=Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA
An ultrafast atomic layer deposition technique is presented, based on the spatial separation of the half-reactions, with which alumina layers can be deposited with deposition rates of more than 1 nm/s. The deposition rate is limited by the water half
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::25632279a997ff50ed114d572c30490d
https://doi.org/10.1149/ma2010-02/20/1438
https://doi.org/10.1149/ma2010-02/20/1438
