Method and apparatus for depositing atomic layers on a substrate

Autor: Vermeer, A.J.P.M., Roozeboom, F., Deelen, J. van

Method of depositing an atomic layer on a substrate. the method comprises supplying a precursor gas fraom a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the presursor-gas supply to

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::534c97dc25d98fb210210191b16797eb
http://resolver.tudelft.nl/uuid:d7ad1dd6-7435-4341-a29f-6bc5b5c82ec5

Method and apparatus for depositing atomic layers on a substrate

Autor: Vermeer, A.J.P.M., Roozeboom, Fred, van Deelen, Joop, Plasma & Materials Processing

Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply tow

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::61575a9380d98bdfcdb4997a1f9405f4
https://research.tue.nl/nl/publications/ddaf1c51-6884-4e2e-be69-2cd21e6acbb8

Apparatus and method for reactive ion etching

Autor: Roozeboom, F., Lankhorst, A.M., Poodt, P.W.G., Koster, N.B., Winands, G.J.J., Vermeer, A.J.P.M., Plasma & Materials Processing

The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::d6ab630a4b1ab0f6609ab1c84add7291
https://research.tue.nl/nl/publications/e9b33a2d-808c-4f18-b309-745326a5e214