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Autor:
Hetterscheid DG; Leiden Institute of Chemistry, Leiden University, PO Box 9502, 2300 RA Leiden, The Netherlands. d.g.h.hetterscheid@chem.leidenuniv.nl., van der Ham CJ; Leiden Institute of Chemistry, Leiden University, PO Box 9502, 2300 RA Leiden, The Netherlands. d.g.h.hetterscheid@chem.leidenuniv.nl., Diaz-Morales O; Leiden Institute of Chemistry, Leiden University, PO Box 9502, 2300 RA Leiden, The Netherlands. d.g.h.hetterscheid@chem.leidenuniv.nl., Verhoeven MW; Laboratory for Physical Chemistry of Surfaces, Eindhoven University of Technology, Eindhoven, The Netherlands., Longo A; Dutch-Belgian Beamline (DUBBLE), ESRF - The European Synchrotron, CS40220, 38043 Grenoble Cedex 9, France., Banerjee D; Dutch-Belgian Beamline (DUBBLE), ESRF - The European Synchrotron, CS40220, 38043 Grenoble Cedex 9, France., Niemantsverdriet JW; Laboratory for Physical Chemistry of Surfaces, Eindhoven University of Technology, Eindhoven, The Netherlands., Reek JN; Van 't Hoff Institute for Molecular Sciences, University of Amsterdam, Amsterdam, The Netherlands., Feiters MC; Institute for Molecules and Materials, Radboud University, Heyendaalseweg 135, 6525 AJ Nijmegen, The Netherlands.
Publikováno v:
Physical chemistry chemical physics : PCCP [Phys Chem Chem Phys] 2016 Apr 28; Vol. 18 (16), pp. 10931-40.