Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Venugopal Vellanki"'
Autor:
Venugopal Vellanki, Mark Wylie, Shad Hedges, Mark D. Eickhoff, Tim Simmons, Chin Le, Jeff McMurran
Publikováno v:
25th European Mask and Lithography Conference.
Conventional photomask inspection techniques utilize global sensitivity for all inspected area in the die; SRAF and OPC features become the sensitivity-limiters for advanced photomasks which can result in reduced sensitivity to defects of interest (D
Autor:
Lena Zavyalova, Gary Zhang, Donis G. Flagello, Bruce W. Smith, Patrick Reynolds, Anatoly Bourov, Venugopal Vellanki
Publikováno v:
SPIE Proceedings.
An automated aberration extraction method is presented which allows extraction of lithographic projection lens' aberration signature having only access to object (mask) and image (wafer) planes. Using phase-wheel targets on a two-level 0/ir phase shi
Autor:
Sopa Chevacharoenkul, Patrick Reynolds, Scott Jessen, Winston Yan, Venugopal Vellanki, Jan Hauschild, Marco Pieters, Joe Ganeshan, Gary Zhang, Qizhi He, Stephen J. DeMoor
Publikováno v:
SPIE Proceedings.
The understanding of focus variation across a wafer is crucial to CD control (both ACLV and AWLV) and pattern fidelity on the wafer and chip levels. This is particularly true for the 65nm node and beyond, where focus margin is shrinking with the desi