Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Veli-Matti Airaksinen"'
Autor:
Markku Tilli, Mervi Paulasto-Kröckel, Teruaki Motooka, Veikko Lindroos, Veli-Matti Airaksinen, Sami Franssila, Ari Lehto
A comprehensive guide to MEMS materials, technologies and manufacturing, examining the state of the art with a particular emphasis on current and future applications. Key topics covered include: Silicon as MEMS material Material properties and measur
Autor:
Timo Aalto, Veli-Matti Airaksinen, Stephan Gerhard Albert, Giorgio Allegato, Marco Amiotti, Olli Anttila, Juergen Auersperg, Antonio Bonucci, Indranil Ronnie Bose, Tanja Braun, Mikael Broas, J. Burggraf, Christopher Cameron, Rob N. Candler, Zhen Cao, André Cardoso, Kuo-Shen Chen, Andrea Conte, Adriana Cozma, Cristina E. Davis, Sophia Dempwolf, Pradeep Dixit, Michael Dost, Viorel Dragoi, Simo Eränen, Bruno Fain, B. Figeys, Andreas C. Fischer, Christoph Flötgen, Sami Franssila, Alois Friedberger, Marc Fueldner, Maria Ganchenkova, Pilar Gonzalez, Miguel A. Gosálvez, Michael Grimes, Atte Haapalinna, Paul Hagelin, Paul Hammond, Kimmo Henttinen, Vesa Henttonen, David Horsley, Takeo Hoshi, Satoshi Itoh, Henrik Jakobsen, R. Jansen, Kerstin Jonsson, Dirk Kähler, Harindra Kumar Kannojia, Hannu Kattelus, Gudrun Kissinger, Roy Knechtel, Kathrin Knese, Kai Kolari, Mika Koskenvuori, Heikki Kuisma, Amit Kulkarni, Franz Laermer, Christof Landesberger, Christina Leinenbach, Michael K. LeVasseur, Jue Li, Yuyuan Lin, Paul F. Lindner, K. Lodewijks, Fabian Lofink, Giorgio Longoni, Sebastian Markus Luber, M. Mahmud-ul-hasan, Jari Mäkinen, Matti Mäntysalo, Devin Martin, Federico Maspero, Toni T. Mattila, Luca Mauri, Peter Merz, Doug Meyer, Marco Moraja, Teruaki Motooka, Gerhard Müller, Paul Muralt, Risto M. Nieminen, Frank Niklaus, Laura Oggioni, Juuso Olkkonen, Elmeri Österlund, Kuang-Shun Ou, Jari Paloheimo, Toni P. Pasanen, Mervi Paulasto-Kröckel, Thomas Plach, Jean-Philippe Polizzi, Klaus Pressel, Matti Putkonen, Riikka L. Puurunen, Wolfgang Reinert, Enea Rizzi, V. Rochus, Glenn Ross, X. Rottenberg, Lauri Sainiemi, Hele Savin, Harald Schenk, Marc Schikowski, Matthias Schulze, S. Seema, S. Severi, Lasse Skogström, Tadatomo Suga, Scott Sullivan, Tommi Suni, Horst Theuss, Markku Tilli, H.A.C. Tilmans, Ilkka Tittonen, Hannah Tofteberg, Pekka Törmä, Santeri Tuomikoski, Frode Tyholdt, Tsuyoshi Uda, Örjan Vallin, Carlo Valzasina, Timo Veijola, Eeva Viinikka, Dietmar Vogel, Andreas Vogl, Vesa Vuorinen, W.J. Westervelde, Sebastian Wicht, Robert Wieland, Bernhard Winkler, Levent Yobas, Luca Zanotti, I. Zubel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16f0bddf47c3d8c3eaa0f0359a359b22
https://doi.org/10.1016/b978-0-12-817786-0.00065-7
https://doi.org/10.1016/b978-0-12-817786-0.00065-7
Autor:
David Cameron, Aapo Varpula, Mikko Utriainen, Veli Matti Airaksinen, Juha Sinkkonen, Sami Franssila, Antti J. Niskanen, Sergey Novikov, Gomathi Natarajan
Publikováno v:
Niskanen, A J, Varpula, A, Utriainen, M, Natarajan, G, Cameron, D C, Novikov, S, Airaksinen, V-M, Sinkkonen, J & Franssila, S 2010, ' Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors ', Sensors and Actuators B: Chemical, vol. 148, no. 1, pp. 227-232 . https://doi.org/10.1016/j.snb.2010.05.018
We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response t
Publikováno v:
Journal of Nanoscience and Nanotechnology. 9:3763-3770
Nanoporous anodic alumina membranes and silicon samples with plasma etched nanopores have been coated with zinc oxide or gold layer using atomic layer deposition (ALD) or sputtering, respectively. In the case of ALD process, the precursor pulses were
Autor:
Veli Matti Airaksinen
In this chapter, silicon wafer thin film measurements are explained. In silicon MEMS, the silicon wafer provides both the substrate and the material for the active device layer. For each type of wafer, the main requirements are sufficient thickness u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::935db4497afa2e2d6109731626face01
https://doi.org/10.1016/b978-0-323-29965-7.00015-4
https://doi.org/10.1016/b978-0-323-29965-7.00015-4
Autor:
Timo Aalto, Veli-Matti Airaksinen, Marco Amiotti, Olli Anttila, Antonio Bonucci, K. Brudziński, Rob N. Candler, Zhen Cao, Kuo-Shen Chen, Andrea Conte, Cristina E. Davis, Pradeep Dixit, Viorel Dragoi, Simo Eränen, Andreas C. Fischer, Sami Franssila, Alois Friedberger, Maria Ganchenkova, Pilar Gonzalez, Miguel A. Gosálvez, J. Gronicz, Atte Haapalinna, Paul M. Hagelin, Paul Hammond, Kimmo Henttinen, David Horsley, Akihisa Inoue, Henrik Jakobsen, Kerstin Jonsson, Dirk Kähler, Hannu Kattelus, Roy Knechtel, Kathrin Knese, Kai Kolari, Mika Koskenvuori, Heikki Kuisma, Amit Kulkarni, Franz Laermer, Adriana Cozma Lapadatu, Christina Leinenbach, Michael K. LeVasseur, Jue Li, Paul Lindner, Veikki Lindroos, Fabian Lofink, Giorgio Longoni, Jari Mäkinen, Matti Mäntysalo, Devin Martin, Toni Mattila, Luca Mauri, Peter Merz, Doug Meyer, Marco Moraja, Teruaki Motooka, Gerhard Müller, Paul Muralt, S. Nagao, Risto M. Nieminen, Frank Niklaus, R. Nowak, Juuso Olkkonen, Kuang-Shun Ou, Jari Paloheimo, Mervi Paulasto-Kröckel, Helena Pohjonen, Klaus Pressel, Matti Putkonen, Riikka L. Puurunen, Wolfgang Reinert, Enea Rizzi, Xavier Rottenberg, Tapani Ryhänen, Lauri Sainiemi, Hele Savin, Parmanand Sharma, Scott Sullivan, Tommi Suni, Horst Theuss, Markku Tilli, Ilkka Tittonen, Hannah Tofteberg, Pekka Törmä, Santeri Tuomikoski, Frode Tyholdt, Tsuyoshi Uda, Örjan Vallin, Timo Veijola, Eeva Viinikka, Andreas Vogl, Vesa Vuorinen, Levent Yobas, P. Zachariasz, I. Zubel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c015e471dd1703629e7ae1c1a2f169d
https://doi.org/10.1016/b978-0-323-29965-7.00046-4
https://doi.org/10.1016/b978-0-323-29965-7.00046-4
Autor:
Veli-Matti Airaksinen
In this chapter, measuring MEMS in explained in detail. Silicon-based MEMS technology is a direct offspring of the much larger silicon-integrated circuit technology. The basic fabrication processes, as well as most of the tools and materials, are bas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78ddca374107b4493666af078135ea30
https://doi.org/10.1016/b978-0-323-29965-7.00014-2
https://doi.org/10.1016/b978-0-323-29965-7.00014-2
Autor:
Timo Aalto, Veli-Matti Airaksinen, Marco Amiotti, Olli Anttila, Paul A. Anzalone, Abhinav Bhushan, Antonio Bonucci, Jakub Bruzdzinski, Robert Candler, Kuo-Shen Chen, Andrea Conte, Cristina Davis, Viorel Dragoi, Simo Eränen, Sami Franssila, Alois Friedberger, Maria Ganchenkova, Lucille Giannuzzi, Miguel Gosálvez, Jakub Gronicz, Atte Haapalinna, Eero Haimi, Kimmo Henttinen, David Horsley, Akihisa Inoue, Henrik Jakobsen, Kerstin Jonsson, Dirk Kähler, Hannu Kattelus, Roy Knechtel, Kathrin Knese, Kai Kolari, Mika Koskenvuori, Heikki Kuisma, Adriana Lapadatu, Franz Laermer, Brandon Van Leer, Ari Lehto, Christina Leinenbach, Paul Lindner, Veikko Lindroos, Giorgio Longoni, Jari Mäkinen, Peter Merz, Douglas J. Meyer, Marco Moraja, Teruaki Motooka, Gerhard Müller, Shijo Nagao, Risto Nieminen, Roman Nowak, Juuso Olkkonen, Kuang-Shun Ou, Jari Paloheimo, Riikka Puurunen, Wolfgang Reinert, Steve Reyntjens, Tapani Ryhänen, Lauri Sainiemi, Hele Savin, Helmut Seidel, Parmanand Sharma, Scott Sullivan, Tommi Suni, Tuomo Suntola, Markku Tilli, Ilkka Tittonen, Santeri Tuomikoski, Örjan Vallin, Timo Veijola, Eeva Viinikka, Oliver Wilhelmi, Piotr Zachariasz, Irena Zubel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef2bccf297d0fb9b423198dd7d284265
https://doi.org/10.1016/b978-0-8155-1594-4.00050-4
https://doi.org/10.1016/b978-0-8155-1594-4.00050-4
Publikováno v:
MRS Proceedings. 681
Mechanical exfoliation strength has been measured in hydrogen implanted , and oriented Si wafers using the crack opening method. The bonding temperature required for exfoliation increases in the order , and . The same method has been applied to study