Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Vasanti A. Deshpande"'
Publikováno v:
SPIE Proceedings.
Isolated to grouped linewidth bias is an important factor in determining the capability of an exposure tool. The process latitude can be significantly improved by minimizing the bias for small geometries (0.5 micron and less). The data presented here
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4384e81b1c39ff222b5c0ec08b235881
https://doi.org/10.1117/12.150437
https://doi.org/10.1117/12.150437
Autor:
Eric M. Apelgren, John S. Hargreaves, Karey L. Holland, Vasanti A. Deshpande, Yumiko Takamori, Nathan S. Thane, Peter Freeman
Publikováno v:
SPIE Proceedings.
The imaging performance of IBM's positive DUV resist is evaluated on SVGL Micrascan. Preliminary results on GCA excimer laser are included. Contamination effects are studied using 0.5 micron lines and spaces on Micrascan I using cross-sections at var
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::246a0fa5e19dd5fb5c8c555370434679
https://doi.org/10.1117/12.148938
https://doi.org/10.1117/12.148938