Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Vallier, Laurent"'
Autor:
Vallier, Laurent
Th. 3e cycle--Phys. des gaz et des plasmas--Paris 11--Orsay, 1983. N°: 3398.
Rés en fr. et en angl.
Rés en fr. et en angl.
Externí odkaz:
http://catalogue.bnf.fr/ark:/12148/cb36101563w
Publikováno v:
Annals of General Psychiatry, Vol 5, Iss Suppl 1, p S100 (2006)
Externí odkaz:
https://doaj.org/article/5d366e7f555546078dcf8e17729ae915
Autor:
Dubois, Jerome, Cunge, Gilles, Darnon, Maxime, Posseme, Nicolas, Vallier, Laurent, Joubert, Olivier
Publikováno v:
11th Frontiers in low temperature plasma diagnostics
11th Frontiers in low temperature plasma diagnostics, May 2015, Hyeres, France
AVS 61st international symposium
AVS 61st international symposium, Oct 2014, Baltimore, United States
11th Frontiers in low temperature plasma diagnostics, May 2015, Hyeres, France
AVS 61st international symposium
AVS 61st international symposium, Oct 2014, Baltimore, United States
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::f26e2078fca9ebc98ea530fd76556001
https://hal.science/hal-02339976
https://hal.science/hal-02339976
Autor:
Dubois, Jerome, Cunge, Gilles, Joubert, Olivier, Darnon, Maxime, Vallier, Laurent, Posseme, Nicolas
Publikováno v:
67th Gaseous Electronic Conference
67th Gaseous Electronic Conference, Oct 2014, Raleigh, United States
67th Gaseous Electronic Conference, Oct 2014, Raleigh, United States
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::d03391c877878057ea3282b6b1779616
https://hal.archives-ouvertes.fr/hal-02339984
https://hal.archives-ouvertes.fr/hal-02339984
Autor:
Pargon, Erwine, Azarnouch, Laurent, Menguelti, Kevin, Fouchier, Marc, Brihoum, Melisa, Ramos, Raphael, Tiron, Raluca, Joubert, Olivier, Vérove, Christophe, Posseme, Nicolas, Vallier, Laurent, Cunge, Gilles, Darnon, Maxime, Banna, Samer, Lill, Torsten
Publikováno v:
China Semiconductor Technology International Conference (CSTIC)
China Semiconductor Technology International Conference (CSTIC), Mar 2012, Shanghai, China
China Semiconductor Technology International Conference (CSTIC), Mar 2012, Shanghai, China
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::07d7bdc57b0886512547c191b5984322
https://hal.archives-ouvertes.fr/hal-02338405
https://hal.archives-ouvertes.fr/hal-02338405
Publikováno v:
Proceedings of SPIE
Metrology, Inspection, and Process Controlfor Microlithography XXI
Metrology, Inspection, and Process Controlfor Microlithography XXI, 2007, San Jose (CA), United States. pp.14, ⟨10.1117/12.712015⟩
Metrology, Inspection, and Process Controlfor Microlithography XXI
Metrology, Inspection, and Process Controlfor Microlithography XXI, 2007, San Jose (CA), United States. pp.14, ⟨10.1117/12.712015⟩
In-line process control in microelectronics manufacturing requires real-time and non-invasive monitoring techniques. Among the different metrology techniques, scatterometry, based on the analysis of ellipsometric signatures (i.e stokes coefficients v
Publikováno v:
Applied Physics Letters
Applied Physics Letters, American Institute of Physics, 1996, 68 ((13),), pp.1775
Applied Physics Letters, 1996, 68 ((13),), pp.1775
Applied Physics Letters, American Institute of Physics, 1996, 68 ((13),), pp.1775
Applied Physics Letters, 1996, 68 ((13),), pp.1775
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::7420c5f211523dfa6156e2bc496ccc80
https://hal.archives-ouvertes.fr/hal-00284566
https://hal.archives-ouvertes.fr/hal-00284566
Autor:
Engelmann, Sebastian U., Wise, Rich S., Prévost, Emilie, Cunge, Gilles, De-Buttet, Côme, Lagrasta, Sebastien, Vallier, Laurent, Petit-Etienne, Camille
Publikováno v:
Proceedings of SPIE; April 2017, Vol. 10149 Issue: 1 p101490M-101490M-11, 10047522p
Autor:
Engelmann, Sebastian U., Wise, Rich S., de Buttet, Côme, Prevost, Emilie, Campo, Alain, Garnier, Philippe, Zoll, Stephane, Vallier, Laurent, Cunge, Gilles, Maury, Patrick, Massin, Thomas, Chhun, Sonarith
Publikováno v:
Proceedings of SPIE; April 2017, Vol. 10149 Issue: 1 p101490L-101490L-13, 10047524p
Akademický článek
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