Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Valerie Stambouli"'
Publikováno v:
Key Engineering Materials. 947:83-88
This work aims to optimize Plasma-Enhanced Chemical Vapour Deposition (PECVD) amorphous hydrogenated silicon carbide (a-SiC:H) as a conformal passivation layer for invasive microelectrode array (MEA) neural interface applications. By carefully tuning
Publikováno v:
Key Engineering Materials. 946:111-118
In this paper, a suitable process technology is employed to fabricate a new open gate silicon carbide-based junction field-effect transistor (OG-4H-SiC-JFET) intended to be used for all types of biochemical sensing applications. The main focus is ded
Autor:
Olfa Karker, Konstantinos Zekentes, Aude Bouchard, Isabelle Gélard, Xavier Mescot, Valerie Stambouli, Edwige Bano
Publikováno v:
Materials Science Forum. 1062:608-612
A SiCNWFET device serving as a biosensor was designed and simulated using Silvaco ATLAS device simulation software. The performance of the designed device in charges sensing was investigated. The device shows the ability to recognize different interf
Publikováno v:
Sensors, Vol 15, Iss 5, Pp 10686-10704 (2015)
Nanoporous SnO2 thin films were elaborated to serve as sensing electrodes for label-free DNA detection using electrochemical impedance spectroscopy (EIS). Films were deposited by an electrodeposition process (EDP). Then the non-Faradic EIS behaviour
Externí odkaz:
https://doaj.org/article/493cee419f024bf69be1f510a9a1f621
Autor:
Mireille Mouis, Maxime Legallais, Thibauld Cazimajou, Fanny Morisot, Thuy Thi Thu Nguyen, Monica Vallejo Perez, Céline Ternon, Valerie Stambouli, gerard ghibaudo, Bassem Salem, Christoforos Theodorou, Irina Ionica, Ganesh Jayakumar, Per-Erik Hellstrom, Saul Rodriguez, Joachim Luque, Claudio Zuliani, Karl Rohracher, Kudlaty, J.
Publikováno v:
HAL
Journées Nationales Nanofils Semiconducteurs Journées Nationales Nanofils Semiconducteurs, Lyon, 13-15 Nov. 2019
Journées Nationales Nanofils Semiconducteurs Journées Nationales Nanofils Semiconducteurs, Lyon, 13-15 Nov. 2019, Nov 2019, Lyon, France
Journées Nationales Nanofils Semiconducteurs Journées Nationales Nanofils Semiconducteurs, Lyon, 13-15 Nov. 2019
Journées Nationales Nanofils Semiconducteurs Journées Nationales Nanofils Semiconducteurs, Lyon, 13-15 Nov. 2019, Nov 2019, Lyon, France
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::a648198bedd15b49220648026f0f5f16
https://hal.univ-grenoble-alpes.fr/hal-02400730
https://hal.univ-grenoble-alpes.fr/hal-02400730
Autor:
Thibauld Cazimajou, Maxime Legallais, Thuy Thi Thu Nguyen, Mireille Mouis, Céline Ternon, Valerie Stambouli, gerard ghibaudo
Publikováno v:
Nanoelectronics and Smart Systems Technologies for Future Applications (Joint SiNano-NEREID-Nanonets2Sense-Convergence Workshop at ESSDERC 2018)
Nanoelectronics and Smart Systems Technologies for Future Applications (Joint SiNano-NEREID-Nanonets2Sense-Convergence Workshop at ESSDERC 2018), Sep 2018, Dresden, Germany
HAL
Nanoelectronics and Smart Systems Technologies for Future Applications (Joint SiNano-NEREID-Nanonets2Sense-Convergence Workshop at ESSDERC 2018), Sep 2018, Dresden, Germany
HAL
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::540b00f90b67025728719d22ffa40d9f
https://hal.univ-grenoble-alpes.fr/hal-02401189
https://hal.univ-grenoble-alpes.fr/hal-02401189
Publikováno v:
Analyst; Jul2008, Vol. 133 Issue 8, p1097-1103, 7p