Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Valeriano Ferreras Paz"'
Publikováno v:
Applied optics. 60(34)
For a multiview autostereoscopic three-dimensional display based on the lenticular lens, the manufacturing errors and inhomogeneities of the lenticular sheet can deteriorate the view image quality. A calibration method is proposed by filtering the pi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32465efac39b850f9b34b7de01204acd
https://pubmed.ncbi.nlm.nih.gov/35200930
https://pubmed.ncbi.nlm.nih.gov/35200930
Publikováno v:
SID Symposium Digest of Technical Papers. 49:76-79
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e782d0bf752b90c9ea88e9c6ffa326e
https://doi.org/10.1002/sdtp.12562
https://doi.org/10.1002/sdtp.12562
Publikováno v:
2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD).
In recent years, displays are gaining increasing importance for automotive applications. However, these displays are not standard displays used in consumer electronics. Instead, they are specifically developed for their respective use case. This incl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a1a789204fd059ba823073d886f37dd
https://doi.org/10.23919/am-fpd.2019.8830570
https://doi.org/10.23919/am-fpd.2019.8830570
Publikováno v:
High Quality Liquid Crystal Displays and Smart Devices-Volume 1: Development, display applications and components ISBN: 9781785619250
In this chapter, we would like to give a brief outline of the areas in which automotive displays will be used today and in the future. We would also like to give an insight into the environmental requirements placed on such displays and which aspects
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::403cd4ab033efc48576ceac6ec93dc7f
https://doi.org/10.1049/pbcs068f_ch9
https://doi.org/10.1049/pbcs068f_ch9
Publikováno v:
2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD).
To ensure end-user readability, displays exposed to sunlight need special surface treatments. Especially in automotive applications, rough antiglare (AG) surface treatments are applied to the top surface. However, a rough surface on top of a brillian
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8337bb5bf04e60005ea8e6c7afaf0621
https://doi.org/10.23919/am-fpd.2018.8437439
https://doi.org/10.23919/am-fpd.2018.8437439
Publikováno v:
Microelectronic Engineering. 86:1029-1032
Optical scatterometry has established itself as one of the mainly applied methods for CD metrology besides CD-SEM during the recent years. However, grating imperfections such as line edge roughness have been largely neglected in scatterometry models
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e4140197338601c40e16442c8a820d1
https://doi.org/10.1016/j.mee.2008.11.019
https://doi.org/10.1016/j.mee.2008.11.019
Autor:
Sandy, Peterhänsel, Maria Laura, Gödecke, Valeriano Ferreras, Paz, Karsten, Frenner, Wolfgang, Osten
Publikováno v:
Optics express. 23(19)
With the help of simulations we study the benefits of using coherent, phase-structured illumination to detect the overlay error in resist gratings fabricated by double patterning. Evaluating the intensity and phase distribution along the focused spot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::39b456eea80548ee58be36c4348bb84c
https://pubmed.ncbi.nlm.nih.gov/26406630
https://pubmed.ncbi.nlm.nih.gov/26406630
Publikováno v:
Fringe 2013 ISBN: 9783642363580
The optimization of the lithographic process in semiconductor industry is continuously conducting towards smaller devices and structures but at the same time highly increasing metrology exigencies.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a7ed236227cbc8af66e00a7603ac4b22
https://doi.org/10.1007/978-3-642-36359-7_62
https://doi.org/10.1007/978-3-642-36359-7_62
Autor:
Christoph Hohle, Arie Jeffrey Den Boef, Marc Hauptmann, Philipp Jaschinsky, Valeriano Ferreras Paz, Uwe Seifert, Johannes Kretz, Manfred Mört, Kang-Hoon Choi, Katja Keil, Laszlo Szikszai, F. Thrum
Publikováno v:
Alternative Lithographic Technologies.
Electron beam direct write (EBDW) can be utilized for developing metrology methods for future technology nodes. Due to its advantage of high resolution and flexibility combined with suitable throughput capability, variable-shaped E-Beam lithography i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87ab78c6b2d2bbc1b8ef6ad2cd45cf71
https://doi.org/10.1117/12.814181
https://doi.org/10.1117/12.814181
Autor:
Wolfgang Osten, Laszlo Sziksai, Thomas Schuster, Christoph Hohle, Karsten Frenner, Manfred Mört, Valeriano Ferreras Paz, Harald Bloess
Publikováno v:
Fringe 2009 ISBN: 9783642030505
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51e1c7379f147831c217c866d3fe9190
https://doi.org/10.1007/978-3-642-03051-2_101
https://doi.org/10.1007/978-3-642-03051-2_101