Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Valdemar Stankevic"'
Publikováno v:
Journal of Science: Advanced Materials and Devices, Vol 9, Iss 4, Pp 100804- (2024)
The growing demand for flexible, high-quality fabrication of free-form micro-optics drives the development of laser-based fabrication techniques for both the shape formation and surface polishing of optical elements. In this paper, we performed a tho
Externí odkaz:
https://doaj.org/article/eb317d33920c4e8c98cd5a6c82dfca83
Autor:
Lucas Rovige, Joséphine Monzac, Julius Huijts, Igor A. Andriyash, Aline Vernier, Jaismeen Kaur, Marie Ouillé, Zhao Cheng, Vidmantas Tomkus, Valdas Girdauskas, Gediminas Raciukaitis, Juozas Dudutis, Valdemar Stankevic, Paulius Gecys, Rodrigo Lopez-Martens, Jérôme Faure
Publikováno v:
The European Physical Journal. Special Topics
The European Physical Journal. Special Topics, 2022, ⟨10.1140/epjs/s11734-022-00675-7⟩
The European Physical Journal. Special Topics, 2022, ⟨10.1140/epjs/s11734-022-00675-7⟩
International audience; In laser-wakefield acceleration, an ultra-intense laser pulse is focused into an underdense plasma to accelerate electrons to relativistic velocities. In most cases, the pulses consist of multiple optical cycles and the intera
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::201a410530612a56bdb6c47b34ed9459
https://doi.org/10.1140/epjs/s11734-022-00675-7
https://doi.org/10.1140/epjs/s11734-022-00675-7
Autor:
Mindaugas Gedvilas, Justinas Mikšys, Jonas Berzinš, Valdemar Stankevič, Gediminas Račiukaitis
Publikováno v:
Scientific Reports, Vol 7, Iss 1, Pp 1-10 (2017)
Abstract The evidence of multi-photon absorption enhancement by the dual-wavelength double-pulse laser irradiation in transparent sapphire was demonstrated experimentally and explained theoretically for the first time. Two collinearly combined laser
Externí odkaz:
https://doaj.org/article/078b28d5921a409cbcf6906fcd30c373
Publikováno v:
Micromachines, Vol 11, Iss 5, p 483 (2020)
Femtosecond laser-induced selective etching (FLISE) is a promising technology for fabrication of a wide range of optical, mechanical and microfluidic devices. Various etching conditions, together with significant process optimisations, have already b
Externí odkaz:
https://doaj.org/article/17ec3c5f9aa44430b40453c6578180fd