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pro vyhledávání: '"Vaishali Vorha"'
Autor:
Takeaki Ebihara, George G. Barclay, Carolyne Stafford, Vaishali Vorha, Marc D. Levenson, Michael T. Reilly, Yasutaka Morikawa, Naoya Hayashi, Martin E. Mastovich
Publikováno v:
SPIE Proceedings.
Vortex masks composed of rectangles with nominal phases of 0°, 90°, 180° and 270° have been shown to print sub-100nm vias and via arrays when projected into negative resist using 248nm light. Arrays with pitches down to 210nm and CDs as small as