Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Vaishali R. Vohra"'
Autor:
Kevin O'Shea, Yoshihiro Yamamoto, Jin Wuk Sung, Libor Vyklicky, Pushkara Rao Varanasi, George G. Barclay, Irene Popova, James F. Cameron, Jason A. DeSISTO, Manabu Hidano, Johan Amara, David Valeri, Vaishali R. Vohra, Greg Prokopowicz, Adam Ware, Tomoki Kurihara, Kathleen M. O'Connell, Wu-Song Huang
Publikováno v:
Journal of Photopolymer Science and Technology. 22:17-24
A new family of materials has been developed to serve as a wet-developable bottom antireflective coating (D-BARC) for patterning levels that have a strong need to avoid dry-etch processes for BARC-open steps. Such include some implant levels, where d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::82c1c025ab30f31631633756506e17c2
https://doi.org/10.2494/photopolymer.22.17
https://doi.org/10.2494/photopolymer.22.17
Publikováno v:
Journal of Polymer Science Part B: Polymer Physics. 41:3151-3159
The phenomenon of intercalation is widely known as a key process in the area of polymer/layered silicate nanocomposites. In the formation of such nanocomposites, a polymer chain is intercalated between the layers of a layered (silicate) host, typical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a22461db16f605b1af24ccc33c381fac
https://doi.org/10.1002/polb.10719
https://doi.org/10.1002/polb.10719
Autor:
Thomas John Markley, Young-Je Kwark, Vladimir Jakubek, Katsuji Douki, Eric Anthony Robertson, Richard Van Court Carr, Daniel Miller, Vaishali R. Vohra, Will Conley, Paul Zimmerman, Christopher K. Ober, John Anthony Marsella, Xiang-Qian Liu
Publikováno v:
Journal of Photopolymer Science and Technology. 16:573-580
Several strategies were employed to improve the transparency and etch resistance of the acrylate-based 157 nm photoresists. (1) α-Fluorinated acrylates were synthesized and polymerized using radical initiation. The homopolymer of 2-[4-(2-hydroxy-hex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4dc1192b863100f8dbc62185afbab4c
https://doi.org/10.2494/photopolymer.16.573
https://doi.org/10.2494/photopolymer.16.573
Autor:
Katsuji Douki, Paul Zimmerman, Will Conley, Vaishali R. Vohra, Daniel Miller, Young-Je Kwark, Xiang-Qian Liu, Christopher K. Ober
Publikováno v:
Journal of Photopolymer Science and Technology. 15:603-611
2-[4-(2-hydroxyhexafluoro isopropyl)cyclohexane]hexafluoroisopropyl acrylate (AF) was prepared as a key monomer for 157nm photoresist platforms. In order to balance transparency with other desirable traits such as etch resistance, new strategies for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a067c1ddc9486af50ea8dfcaa2cbcfab
https://doi.org/10.2494/photopolymer.15.603
https://doi.org/10.2494/photopolymer.15.603
Autor:
Vaishali R. Vohra, Xiang-Qian Liu, Katsuji Douki, Christopher K. Ober, Will Conley, Paul Zimmerman, Daniel Miller
Publikováno v:
Advances in Resist Technology and Processing XX.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1df7389b6f87bc7430403595ebe3a18
https://doi.org/10.1117/12.485097
https://doi.org/10.1117/12.485097
Autor:
Xiang-Qian Liu, Daniel Miller, Christopher K. Ober, Vaishali R. Vohra, Paul Zimmerman, Katsuji Douki, Will Conley, Young-Je Kwark, Young Cheol Bae
Publikováno v:
SPIE Proceedings.
Hexafluoroisopropyl alcohol-functionalized acrylate monomers and their (co)polymers were prepared as photoresist platforms for 157 nm imaging. In order to balance transparency with other desirable traits such as etch resistance, we developed several
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41856c4941a5b8738149d4d04f679f82
https://doi.org/10.1117/12.474169
https://doi.org/10.1117/12.474169