Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Vadim Sidorkin"'
Publikováno v:
In Thin Solid Films 2006 495(1):375-379
Autor:
G. R. Cantrell, Vadim Sidorkin, Stefan Proske, Stephan Zimmermann, Markus Bender, Michael Finken
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
The lack of defect-free EUV photomask blanks is one of the multiple challenges in the application of EUV lithography for high volume wafer manufacturing. In EUV photomask manufacturing, shifting the design before writing to avoid patterning over blan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a985fb7e7179273873c5c6718a187171
https://doi.org/10.1117/12.2513666
https://doi.org/10.1117/12.2513666
Autor:
Nadir S. Faradzhev, Vadim Sidorkin
Publikováno v:
Journal of Vacuum Science & Technology A, 27 (2), 2009
The authors report on the interaction of atomic hydrogen with Sn and thin Ru film at room temperature. The study is done using a combination of photoelectron and low energy ion scattering spectroscopies as well as scanning electron microscopy. The ad
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8aa6c3d83d71c65facc8e4db365ef233
https://doi.org/10.1116/1.3081968
https://doi.org/10.1116/1.3081968
Publikováno v:
Journal of Vacuum Science & Technology B, 26 (6), 2008
Performance of hydrogen silsesquioxane (HSQ) resist material with respect to the temperature during electron beam exposure was investigated. Electron beam exposure at elevated temperatures up to 90?°C shows sensitivity rise and slight contrast (?) d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ae5bc31762604bc8ba5462baed07780b
https://doi.org/10.1116/1.2987965
https://doi.org/10.1116/1.2987965
Publikováno v:
Journal of Electroceramics. 17:479-485
Pyroelectric electron emission current measure- ments and spatial electron current distribution collections were investigated from -Z face polar surface of lithium nio- bate monodomain crystals. The electron emission was detected during cooling due t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69f3deb5fc6439e9e8e42d4e91f5266a
https://doi.org/10.1007/s10832-006-0387-y
https://doi.org/10.1007/s10832-006-0387-y
Publikováno v:
SPIE Proceedings.
We quantitatively evaluate Nuflare’s latest resist charging effect correction (CEC) model for advanced photomask production using e-beam lithography. Functionality of this CEC model includes the simulation of static and timedependent charging effec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96b2c9c92a043a4b8f4d3572842b77b0
https://doi.org/10.1117/12.2066126
https://doi.org/10.1117/12.2066126
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 24:224
Factors influencing the transferred image resolution in 1:1 electron projection lithography system are considered. The influence of Coulomb interaction between electrons, gradient of magnetic field, and angle between focusing electric and magnetic fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d54ea02b9b0c5d8af64d1f9b7f1c9e8
https://doi.org/10.1116/1.2162574
https://doi.org/10.1116/1.2162574
Autor:
Cho, Choong-Rae choongrae.cho@samsung.com, Cho, SungIl1, Vadim, Sidorkin1, Jung, Ranju1, Yoo, Inkyeong1
Publikováno v:
Thin Solid Films. Jan2006, Vol. 495 Issue 1/2, p375-379. 5p.