Zobrazeno 1 - 2
of 2
pro vyhledávání: '"VYSOTSKIY, V. B."'
Publikováno v:
Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, Iss 4, Pp 29-32 (2011)
The research has been carried out on dependence of mechanical stress on the modes of deposition of silicon nitride and oxide films obtained by plasma excited chemical vapour deposition of the layers from the gas phase (PECVD). The connection has been
Externí odkaz:
https://doaj.org/article/341c36a8f31f498bb43af7f32f65e24b
Publikováno v:
Physics, Chemistry & Applications of Nanostructures - Proceedings of the International Conference Nanomeeting - 2015; 2015, p358-361, 4p