Zobrazeno 1 - 10
of 135
pro vyhledávání: '"V.E. Yurasova"'
Publikováno v:
Vacuum. 138:139-145
A sensitive method of visualization by sputtering of deformed areas buried under a surface is developed. The effect of varying the lattice constant and binding-energy of surface atoms of binary disordered alloys on the sputtering of areas deformed by
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 273:76-79
MD simulation was applied to study disordered NiPd alloy sputtering under normal and oblique incidence of Ar ions at energy E 0 = 0.1–20 keV. Energy dependences of NiPd alloys and their components sputtering were studied and discussed for various i
Autor:
V.M. Vishnyakov, V.I. Bachurin, K.F. Minnebaev, R. Valizadeh, D.G. Teer, J.S. Colligon, V.V. Vishnyakov, V.E. Yurasova
Publikováno v:
Thin Solid Films. 497:189-195
Chromium titanium nitride films with different content of Cr and Ti were deposited on a silicon substrate by ion beam assisted deposition and characterised by Rutherford Backscattering Spectroscopy, X-ray Diffraction, X-ray Photoelectron Spectroscopy
Publikováno v:
Radiation Effects and Defects in Solids. 158:573-582
A molecular dynamics simulation was performed to study the sputtering yield Y for BN, AlN and GaN polycrystals of wurtzite structure as a function of the masses m 1 of bombarding ions with energies from 200 to 2000 eV. A nonmonotonic behavior of the
Publikováno v:
Scopus-Elsevier
Sputtering of single and polycrystals of three nitrides BN, AlN and GaN of wurzite structure by Ar ions with energy E 0 =0.3–10 keV was computer simulated by the molecular dynamics method. The total yields are inversely proportional to the binding
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Publikováno v:
Scopus-Elsevier
A study of copper crystal sputtering by 10–2500 eV Ar ions was performed by molecular dynamic computer simulation. Good agreement with experiment was obtained in spatial and energy distributions of sputtered atoms and in energy dependence of sputte
Publikováno v:
Vacuum. 47:425-431
Titanium nitride TiNχ layers with different nitrogen content have been deposited on hard tool steel substrates by unbalanced magnetron sputtering at different nitrogen partial pressures so that the effect of nitrogen content on the structural and me
Autor:
John Colligon, L. Vasilyev, V.E. Yurasova, A. Naumkin, L.N. Lesnevsky, I.I. Shkarban, H. Kheyrandish, A. Rogozin
Publikováno v:
Surface and Coatings Technology. 70:9-17
Titanium nitride films were obtained by three methods: ion-assisted deposition, deposition using the cathode spot arc discharge system (ion plating) and deposition using a planar magnetron. The resulting films were analysed by X-ray photoelectron spe
Publikováno v:
Vacuum. 45:45-47
Computer calculations of the relaxation of Ni monocrystal near-surface layers about the Curie point Tc with thermal vibration taken into account were performed in this work. Anomalous relaxation was found near Tc. This relaxation was shown to lead to