Zobrazeno 1 - 10
of 18
pro vyhledávání: '"V. Run"'
Autor:
R. F. Schlenk, D. Weber, J. Krzykalla, T. Kindler, G. Wulf, B. Hertenstein, H. R. Salih, T. Südhoff, J. Krauter, U. Martens, S. Wessendorf, V. Runde, H. J. Tischler, M. Bentz, E. Koller, M. Heuser, F. Thol, A. Benner, A. Ganser, K. Döhner, H. Döhner
Publikováno v:
Scientific Reports, Vol 13, Iss 1, Pp 1-9 (2023)
Abstract The aim of this randomized clinical trial was to evaluate the impact of all-trans retinoic acid (ATRA) in combination with non-intensive chemotherapy in older unfit patients (> 60 years) with newly diagnosed NPM1-mutated acute myeloid leukem
Externí odkaz:
https://doaj.org/article/83f58ea12fd74494a07f488be779b02c
Publikováno v:
International Journal of Infectious Diseases. 73:75
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e331d155ff5c2503f80cb4f08f3fceb7
https://doi.org/10.1016/j.ijid.2018.04.3596
https://doi.org/10.1016/j.ijid.2018.04.3596
Autor:
C. Roesch, Chetan E. Chitnis, Didier Menard, S. Ramboarina, S. Bin, J. Popovici, V. Run, I. Vigan-Womas
Publikováno v:
International Journal of Infectious Diseases. 73:74
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4dfc59d421137ad5f12c8026cfee451e
https://doi.org/10.1016/j.ijid.2018.04.3595
https://doi.org/10.1016/j.ijid.2018.04.3595
Publikováno v:
Microelectronic Engineering. 23:81-84
An electron beam lithography tool with a Schottky field emitter source has been designed. The electron beam column can produce beam diameters between 6 nm and 250 nm, with corresponding currents up to 250 nA at 20, 50 and 100 kV accelerating voltage.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::09b93ec815a4ef21fcac97f043730e69
https://doi.org/10.1016/0167-9317(94)90109-0
https://doi.org/10.1016/0167-9317(94)90109-0
Autor:
S. Mara, V. Runfola, M. Pannese, C. Caronni, R. Giambruno, D. Campolungo, C. Ghirardi, D. Gabellini
Publikováno v:
HemaSphere, Vol 6, Pp 234-235 (2022)
Externí odkaz:
https://doaj.org/article/770a146a9fc54970ad3864a05badee51
Autor:
L. Leypoldt, M. Gavriatopoulou, B. Besemer, H. Salwender, M.-S. Raab, A. Nogai, C. Khandanpour, V. Runde, M. Zago, P. Martus, H. Goldschmidt, C. Bokemeyer, M. Dimopoulos, K. Weisel
Publikováno v:
HemaSphere, Vol 6, Pp 816-817 (2022)
Externí odkaz:
https://doaj.org/article/332a256d47644c7a9893f14daac86237
Autor:
V. Welch, M. Doull, M. Yoganathan, J. Jull, M. Boscoe, S. E. Coen, Z. Marshall, J. Pardo Pardo, A. Pederson, J. Petkovic, L. Puil, L. Quinlan, B. Shea, T. Rader, V. Runnels, S. Tudiver
Publikováno v:
Research Integrity and Peer Review, Vol 2, Iss 1, Pp 1-11 (2017)
Abstract Background Accurate reporting on sex and gender in health research is integral to ensuring that health interventions are safe and effective. In Canada and internationally, governments, research organizations, journal editors, and health agen
Externí odkaz:
https://doaj.org/article/61a653a7c2e648fba0e27ff6fb0ae1d3
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:3409
We have investigated the usage of high energy (100 kV) electron beam lithography for various applications. Exposures with high energy electrons are less susceptible to resist thickness variations. Additional exposures from adjacent pixels and shapes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17efc4c8cb304f08cd83bfbe674f364a
https://doi.org/10.1116/1.587522
https://doi.org/10.1116/1.587522
Publikováno v:
Japanese Journal of Applied Physics. 32:5982
A new 3-lens electron optical column using a Schottky emitter has been designed to perform very high-resolution lithography and also to produce reticles with good throughput. The theoretical performance has been computed from the source and lens char
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::387cf3c24a2f1188e17b984d14d331d8
https://doi.org/10.1143/jjap.32.5982
https://doi.org/10.1143/jjap.32.5982
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