Zobrazeno 1 - 10
of 84
pro vyhledávání: '"V. P. Derenchuk"'
Publikováno v:
EPJ Web of Conferences. 6/28/2024, Vol. 298, p1-7. 7p.
Publikováno v:
Spin 2004.
Autor:
A. S. Belov, V. P. Derenchuk
Publikováno v:
AIP Conference Proceedings.
The Cooler Injector Polarized IOn Source (CIPIOS) has most recently been used to provide polarized and unpolarized beams of negative deuterium ions for filling the injector synchrotron. More than 1.8 mA of up to 90% polarized D− was available for i
Autor:
V. P. Derenchuk
Publikováno v:
AIP Conference Proceedings.
“The Workshop on Polarized Sources and Targets (PST 2001) was held at the Brown County Inn in Nashville, Indiana from September 30th and October 4th, 2001. It was organized by the Indiana University Cyclotron Facility in Bloomington, Indiana. The W
Autor:
V. P. Derenchuk, A. S. Belov
Publikováno v:
Polarized Sources and Targets.
Publikováno v:
AIP Conference Proceedings.
A nuclear spin‐filter polarimeter is being installed in the high voltage terminal of HIPIOS at the Indiana University Cyclotron Facility. It will be used to measure the polarization of protons and deuterons at a source extraction energy of 10 keV.
Autor:
del Moral, Octavio G.1, Magán, Miguel1, Sordo, Fernando1, Villacorta, Félix J.1 fjimenez@essbilbao.org, Pérez, Mario1
Publikováno v:
EPJ Web of Conferences. 10/9/2023, Vol. 286, p1-6. 6p.
Autor:
B. von Przewoski, D. V. Baxter, A. Bogdanov, S. Clark, V. P. Derenchuk, T. Ellis, C.M. Lavelle, M.B. Leuschner, N. Remmes, T. Rinckel, P.E. Sokol, T. Turflinger
Publikováno v:
2006 IEEE Radiation Effects Data Workshop; 2006, p188-190, 3p
Publikováno v:
Spectroscopy Letters. 17:165-180
The surface of a P type Si wafer was bombarded with 14N2 + and H2 + and the Raman spectrum of the implanted surface was obtained. The recorded spectrum not only confirms the information of various silicon-nitrogen, silicon-hydrogen, silicon-hydrogen-
Publikováno v:
Canadian Journal of Physics. 62:201-206
The surface of a P-type Si wafer was bombarded with [Formula: see text] and then [Formula: see text], and the Raman spectrum of the implanted surface was obtained. The recorded Raman spectrum not only confirms the formation of various silicon–oxyge