Zobrazeno 1 - 10
of 90
pro vyhledávání: '"V. O. Borisov"'
Publikováno v:
Advances in Materials Physics and Chemistry. 11:121-130
A new laser-plasma deposition method has been developed for the plasma chemical deposition of hard silicon carbonitride coatings on stainless steel substrates from the hexamethyldisilazane (HMDS) Si2NH(CH3)6 vapor in a high-speed Ar and Ar + 10 vol.%
Autor:
V. N. Demin, V. O. Borisov, Tamara P. Smirnova, G. N. Grachev, M. N. Khomyakov, A. L. Smirnov
Publikováno v:
Journal of Structural Chemistry. 61:1390-1397
Hard silicon carbonitride coatings are prepared using Ar and Ar (10 vol.% He) laser plasma from hexamethyldisilazane (HMDS) [(CH3)3Si]2NH and HMDS+benzene vapors. The coatings are characterized by infrared (IR), Raman, and X-ray photoelectron spectro
Autor:
Tamara P. Smirnova, A. L. Smirnov, M. N. Khomyakov, V. N. Demin, V. O. Borisov, G. N. Grachev
Publikováno v:
Journal of Structural Chemistry. 58:1503-1509
Carbon nitride coatings are synthesized in the new laser plasma of powerful optical pulsating discharge using acetonitrile as a precursor. A high-pressure and -temperature C3N4 cubic phase with a spinel structure type is obtained. The microhardness o
Publikováno v:
Journal of Structural Chemistry. 58:1573-1580
X-ray photoelectron spectroscopy, X-ray diffraction, and high-resolution transmission electron microscopy (over thickness profiling of the elemental and phase compositions of the samples) are used to investigate the elemental and phase compositions,
Publikováno v:
Journal of Crystal Growth. 523:125156
Here we report the results of studying the crystal structure of solid solutions films, obtained in the HfO 2 -Sc 2 O 3 nano-scale system using of ALD process and volatile complex compounds such as of Hf(N(C 2 H 5 ) 2 ) 4 and [Sc(C 5 H 4 CH 3 ). A num
Publikováno v:
Glass Physics and Chemistry. 41:232-236
A new method of the plasma chemical vapor deposition with the activation of the initial compounds by the plasma of the CO2 laser in the high-speed gas flow has been applied for the synthesis of silicon carbonitride SiCN films on a substrate of stainl
Publikováno v:
Surface Engineering. 31:628-633
A new method of laser plasma deposition had been applied to synthesise the silicon carbonitride (SiCN) coatings on stainless steel substrates and cutting devices using hexamethyldisilazane Si2NH(CH3)6 as a precursor. The precursor vapours were activa
Autor:
Tamara P. Smirnova, L. V. Yakovkina, Andrey A. Saraev, Vasily V. Kaichev, V. O. Borisov, V. N. Kichai
Publikováno v:
Inorganic Materials. 50:158-164
The chemical structure, phase composition, and crystal structure of LaxHf1 − xOy films grown on Si using volatile metalorganic compounds as Hf and La precursors have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, energy disper
Publikováno v:
Journal of Physics: Conference Series. 1105:012131
Publikováno v:
Inorganic Materials. 49:172-178
(HfO2)1 − x (Sc2O3) x films have been grown by chemical vapor deposition (CVD) using the volatile complexes hafnium 2,2,6,6-tetramethyl-3,5-heptanedionate (Hf(thd)4) and scandium 2,2,6,6-tetramethyl-3,5-heptanedionate (Sc(thd)3) as precursors. The