Zobrazeno 1 - 10
of 15
pro vyhledávání: '"V. N. Shabanov"'
Autor:
A. N. Yablonskiĭ, O. A. Kuznetsov, Boris A. Andreev, V. P. Kuznetsov, A. P. Kasatkin, M. V. Kuznetsov, A. V. Kornaukhov, Z. F. Krasilnik, O. V. Belova, V. N. Shabanov
Publikováno v:
Semiconductors. 42:137-141
Temperature dependences of the concentration and electron Hall mobility in Si:Er/Sr epitaxial layers grown at T = 600°C and annealed at 700 or 900°C have been investigated. The layers were grown by sublimation molecular-beam epitaxy in vacuum (∼1
Autor:
V. N. Shabanov, V. P. Kuznetsov, D. I. Kryzhov, G. A. Maksimov, D. Yu. Remizov, A. N. Shushunov, O. V. Belova, M. V. Stepikhova, Z. F. Krasilnik, R. A. Rubtsova
Publikováno v:
Semiconductors. 40:846-853
In Si:Er/Si diode structures grown by sublimation molecular-beam epitaxy in a vacuum with a pressure of ∼10−7 mbar at temperatures 520–580°C, the intensity of room-temperature electroluminescence at 1.54 μm is studied as a function of the con
Autor:
D. I. Kryzhkov, V. P. Kuznetsov, Z. F. Krasil’nik, V. N. Shabanov, D. Yu. Remizov, V. B. Shmagin, L. V. Krasilnikova, M. N. Drozdov
Publikováno v:
Physics of the Solid State. 46:109-112
A series of Si: Er/Si light-emitting diode structures with a smoothly varying p-n junction breakdown mechanism, grown through sublimation molecular-beam epitaxy, is used to investigate the effect of the breakdown mechanism on the electroluminescence
Autor:
O. V. Belova, V. B. Shmagin, A. V. Kornaukhov, K. E. Kudryavtsev, D. Yu. Remizov, Z. F. Krasilnik, V. P. Kuznetsov, M. V. Kuznetsov, Boris A. Andreev, V. N. Shabanov, S. V. Obolensky
Publikováno v:
Semiconductors. 41:1312-1314
Results of experimental studies of erbium ion electroluminescence in p ++/n +/n-Si:Er/n ++ silicon diode structures grown by sublimation molecular-beam epitaxy are discussed. The distinctive feature of these structures is that the regions of electron
Autor:
S. A. Denisov, D. V. Shengurov, V. G. Shengurov, V. N. Shabanov, M. V. Stepikhova, Z. F. Krasilnik, V. Yu. Chalkov, Yu. N. Drozdov, L. V. Krasilnikova, S. P. Svetlov
Publikováno v:
Bulletin of the Russian Academy of Sciences: Physics. 71:113-115
High-quality Si1 − x Ge x :Er epitaxial layers have been grown on Si(100) substrates at a relatively low temperature (500°C) by sublimation of silicon in GeH4 gas atmosphere. It has been established using capacitance-voltage measurements, X-ray di
Publikováno v:
Journal of Experimental and Theoretical Physics Letters. 75:556-558
Results of an experimental observation of the voltage oscillations associated with a discrete tunneling of holes in porous silicon at room temperature are presented. The noise characteristics of diode structures with a porous silicon interlayer forme
Autor:
V. A. Bashkin, V. N. Shabanov
Publikováno v:
Fluid Dynamics. 28:111-118
The method of matched asymptotic expansions is used to investigate the problem of supersonic perfect-gas flow over a semi-infinite surface with longitudinal ribbing formed by imposing small transverse harmonic perturbations on a flat plate. The ratio
Publikováno v:
Hydrotechnical Construction. 26:5-13
Publikováno v:
Scopus-Elsevier
The effect of the substrate temperature Ts on the sheet resistance Rs for polycrystalline Si films obtained by molecular-beam deposition was investigated. It was found that Rs is a nonmonotonic function of Ts for films doped with different impurities
Publikováno v:
Technical Physics Letters. 23:281-283
It is shown that high-quality structures may be fabricated by applying a potential to the substrate to obtain n-and p-type delta-layers during low-temperature growth of epitaxial layers from subliming silicon sources doped with antimony or gallium.