Zobrazeno 1 - 10
of 280
pro vyhledávání: '"V. M. Vorotyntsev"'
Publikováno v:
Russian Journal of Physical Chemistry A. 97:561-564
Autor:
L. A. Mochalov, M. A. Kudryashov, A. A. Logunov, M. A. Vshivtsev, I. O. Prokhorov, V. M. Vorotyntsev, V. M. Malyshev, T. S. Sazanova, Yu. P. Kudryashova, E. N. Bulanov, A. V. Knyazev
Publikováno v:
Russian Journal of Physical Chemistry A. 97:241-247
Publikováno v:
Russian Journal of Physical Chemistry A. 96:54-61
Publikováno v:
Semiconductors. 54:518-522
The possibility of predicting the magnitude of the trapped charge in the buried oxide of silicon-on-insulator structures using the Poole–Frenkel effect is investigated. The conditions for the Poole–Frenkel effect in this layer are determined by m
Publikováno v:
Electronic Enginering.Semiconductor Devices. 254:29-37
Publikováno v:
Semiconductors. 52:1114-1117
It is proposed that the Poole–Frenkel effect be applied to predict radiation-induced charge accumulation in thermal silicon dioxide. Various conduction mechanisms of thermal silicon dioxide are considered, the conditions of the appearance of the Po
Autor:
Vorotyntsev, V.1 vlad@vorotyn.nnov.ru, Drozdov, P.1, Vorotyntsev, I.1, Manokhina, S.1, Knysh, S.1
Publikováno v:
Petroleum Chemistry. Dec2013, Vol. 53 Issue 8, p627-631. 5p.
Autor:
E. L. Shobolov, O. P. Gus’kova, Alexey Mikhaylov, David Tetelbaum, V. M. Vorotyntsev, N. D. Abrosimova
Publikováno v:
Physics of the Solid State. 57:2164-2169
The incorporation of fluorine atoms into the silicon dioxide lattice upon F+ ion implantation and the formation of silicon (germanium) nanocrystals in SiO2 upon Si+ (Ge+) ion implantation have been numerically simulated. The calculations for F have b
Autor:
V. M. Vorotyntsev
Publikováno v:
Petroleum Chemistry. 55:259-275
Physicochemical principles of membrane separation as applied to high purification of gases have been surveyed. The influence of impurity concentration in the feed gas and the membrane material on the separation factor and the role of sorption effects
Publikováno v:
Теоретические основы химической технологии. 49:287-291