Zobrazeno 1 - 10
of 21
pro vyhledávání: '"V. M. Mordvintsev"'
Publikováno v:
Russian Microelectronics. 51:255-263
Publikováno v:
Russian Microelectronics. 50:146-154
The object of research are samples of nonvolatile electrically alterable memory elements (memristors) based on TiN–TiO2–SiO2–W open “sandwich” structures, in which conductive nanostructures with electrically alterable characteristics are fo
Publikováno v:
Russian Microelectronics. 49:269-277
Samples of nonvolatile electrically reprogrammable memory elements (memristors) based on electroformed TiN–TiO2–SiO2–W open sandwich structures, made using thin-film technology, are studied. A technique is developed and experimental studies are
Publikováno v:
Russian Microelectronics. 48:402-408
The dependences of the thickness of the TiO2 layer formed on the TiN surface on a partial pressure (flow) of oxygen in an argon-oxygen plasma of a magnetron sputtering system are established by secondary-ion mass spectrometry. The obtained dependence
Publikováno v:
Technical Physics. 63:1629-1635
Based on experimental data for electroforming in open TiN–SiO2–W sandwich structures (the end face of d = 10–30-nm-thick SiO2 films exposed to vacuum served as an insulating trench), it has been shown that the voltage at which conducive particl
Autor:
S. E. Kudryavtsev, V. M. Mordvintsev
Publikováno v:
Russian Microelectronics. 46:243-251
It is experimentally shown that the introduction of an additional dielectrical layer several nanometers thick (more than 2.5 and 1.3 nm for TiO2 and SiO2, respectively) into open TiN–SiO2–W and Si–SiO2–W “sandwich”-structures on their ano
Publikováno v:
Russian Microelectronics. 45:242-255
Using secondary ion mass spectrometry, we investigate the oxidation of titanium nitride films fabricated by reactive magnetron sputtering under specific conditions of burning plasma in the argon and oxygen mixture in a vacuum chamber of a magnetron s
Publikováno v:
Technical Physics. 60:1376-1383
We report on the results of numerical simulation of the effect of electric field redistribution in the insulating gap of the open TiN–SiO2–W metal–insulator–metal “sandwich” structure upon the formation of an insulating film layer with an
Autor:
V. M. Mordvintsev, S. E. Kudryavtsev
Publikováno v:
Russian Microelectronics. 42:68-78
The results of experimental investigations of electroforming and quasi-static current-voltage (I-V) characteristics of formed TiN-SiO2-W open sandwich structures in comparison to the Si-SiO2-W structures are presented. It is shown that similar memory
Publikováno v:
Russian Microelectronics. 40:87-97
The results of the experimental investigation of the radiation behavior of cells with the use of the electroformed open Si-SiO2-W sandwich structures as memory cells are presented. Information in these structures is coded by the width of a nanometer