Zobrazeno 1 - 10
of 19
pro vyhledávání: '"V. K. Vasiliev"'
Autor:
A. V. Antonov, S. S. Ustavschikov, D. A. Savinov, David Tetelbaum, M. A. Galin, D. V. Masterov, S. V. Morozov, A. I. El’kina, S. A. Pavlov, Pavel A. Yunin, V. K. Vasiliev, Alexey Mikhaylov, A. E. Parafin
Publikováno v:
Physics of the Solid State. 62:1598-1603
The original research results for thin disordered HTSC films based on YBCO are presented in this article. Several experiments have been carried out to confirm a theoretical prediction that the s-phase of superconducting pairing in disordered d-type s
Autor:
V. K. Vasiliev, Alena Nikolskaya, Dmitry Korolev, Sergey Nagornykh, David Tetelbaum, Alexey Mikhaylov, V. I. Pavlenkov, A. N. Tereshchenko, Alexey Belov
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 472:32-35
The goal of this work is the qualitative and quantitative interpretation of experimental data obtained for the effect of additional boron ion implantation on the temperature dependence of dislocation-related luminescence (D1 line) of self-implanted s
Autor:
V. K. Vasiliev
Publikováno v:
Critique and Semiotics. 38:364-379
The unicity of Shukshin’s oeuvre is that from the middle of 1960s when he is consciously seeking for and invents coding tools of his creations. The author himself has pointed out some methods of «code» creation. He pays attention to the “change
Autor:
V. K. Vasiliev, Dmitriy Smolyakov, A. S. Tarasov, David Tetelbaum, A. V. Lukyanenko, F. A. Baron, Alena Nikolskaya, M. V. Dorokhin
Publikováno v:
Materials Letters. 308:131244
The results of determining the energy levels of boron-doped silicon implanted with gallium ions by impedance spectroscopy are reported. In the as-implanted sample the boron level remains the same and a second level appears close to the Ga-level repor
Autor:
D. E. Nikolitchev, Davud V. Guseinov, D. A. Pavlov, David Tetelbaum, A. I. Belov, A. N. Mikhaylov, A. V. Pirogov, D. S. Korolev, Andrey A. Shemukhin, V. K. Vasiliev, A. V. Nezhdanov, E. V. Okulich, S. I. Surodin
Publikováno v:
Semiconductors. 50:271-275
The composition and structure of silicon surface layers subjected to combined gallium and nitrogen ion implantation with subsequent annealing have been studied by the X-ray photoelectron spectroscopy, Rutherford backscattering, electron spin resonanc
Autor:
D. I. Tetelbaum, D. S. Korolev, S. A. Pavlov, A. E. Parafin, A. N. Mikhaylov, D. V. Masterov, A. I. Okhapkin, E. V. Skorokhodov, S. A. Korolev, P. A. Yunin, V. K. Vasiliev
Publikováno v:
Поверхность. Рентгеновские, синхротронные и нейтронные исследования. :80-83
Autor:
A. V. Ikonnikov, D. V. Masterov, P. A. Yunin, D. I. Tetelbaum, S. S. Ustavschikov, Alexey Mikhaylov, A. V. Antonov, S. V. Morozov, V. K. Vasiliev, S. A. Pavlov, A. E. Parafin, D. A. Savinov, Yu. N. Nozdrin
Publikováno v:
Physica C: Superconductivity and its Applications. 568:1353581
We report the effect of disorder on superconducting phase transition of YBa 2 Cu 3 O 7 − x epitaxial thin films in external magnetic fields. The disorder was produced by several successive acts of oxygen ion implantation. Controlling a total accumu
Autor:
D. S. Korolev, David Tetelbaum, S. A. Pavlov, A. I. Okhapkin, D. V. Masterov, S. A. Korolev, Alexey Mikhaylov, A. E. Parafin, V. K. Vasiliev, Pavel A. Yunin, E. V. Skorokhodov
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 10:438-440
The formation of a topological structure in thin films of the high-temperature superconductor YBa2Cu3O7–δ (YBCO) using ion implantation is studied. The crystal structure and electrical properties of the initial film and the formed insulating regio
Publikováno v:
AIP Conference Proceedings.
Publikováno v:
AIP Conference Proceedings.
In this paper, the analysis of the possible replacement of existing multistage membrane and reciprocating compressor units with a set of slow-speed long-stroke compressor stages is carried out. The possibility of replacing the existing multi-stage me