Zobrazeno 1 - 10
of 87
pro vyhledávání: '"V. J. Law"'
Autor:
V. J. Law, D. P. Dowling
Publikováno v:
14th Chaotic Modeling and Simulation International Conference ISBN: 9783030969639
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ded9867b5c1550611015a4eb39bbffb
https://doi.org/10.1007/978-3-030-96964-6_20
https://doi.org/10.1007/978-3-030-96964-6_20
Autor:
V. J. Lawson, Y. Rosenthal, S. C. Bova, J. Lambert, B. K. Linsley, K. Bu, V. J. Clementi, A. Elmore, E. L. McClymont
Publikováno v:
Geochemistry, Geophysics, Geosystems, Vol 25, Iss 8, Pp n/a-n/a (2024)
Abstract Boron to calcium (B/Ca) records in benthic foraminifera, used for reconstructing the carbonate ion saturation state (ΔCO3) of the deep ocean, suggest that carbon sequestration in the Southern Pacific contributed to lowering atmospheric CO2
Externí odkaz:
https://doaj.org/article/5d65720fa25a4fdcaf8c537c1fedad43
Autor:
V. J. Law, D. P. Dowling
Publikováno v:
13th Chaotic Modeling and Simulation International Conference ISBN: 9783030707941
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50309c5802b31292cacb988c52b44346
https://doi.org/10.1007/978-3-030-70795-8_34
https://doi.org/10.1007/978-3-030-70795-8_34
Autor:
V. J. Law, D. P. Dowling
Publikováno v:
13th Chaotic Modeling and Simulation International Conference ISBN: 9783030707941
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c40c611b9c2ebb4dbe36f82c94d6b535
https://doi.org/10.1007/978-3-030-70795-8_35
https://doi.org/10.1007/978-3-030-70795-8_35
Autor:
Denis P. Dowling, V. J. Law
Publikováno v:
12th Chaotic Modeling and Simulation International Conference ISBN: 9783030395148
Over the last 20 years microwave power supplies in domestic microwave ovens have increasingly found applications in plasma reactors for processing of functional carbon-based nanostructures for engineering materials, electronics and biomedical applica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e26b56638c697e4297a21feae8b377d
https://doi.org/10.1007/978-3-030-39515-5_14
https://doi.org/10.1007/978-3-030-39515-5_14
Autor:
V. J. Law, Denis P. Dowling
Publikováno v:
International Journal of Chemical Engineering, Vol 2018 (2018)
This paper reviews the use of domestic microwave ovens as plasma reactors for applications ranging from surface cleaning to pyrolysis and chemical synthesis. This review traces the developments from initial reports in the 1980s to today’s converted
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8a542daedbd04300398b2a4e5f4c5d01
https://doaj.org/article/2d57792e92a24d2d9ae75d1eaeed7796
https://doaj.org/article/2d57792e92a24d2d9ae75d1eaeed7796
Autor:
V. J. Law, Denis P. Dowling
Publikováno v:
Fractional Dynamics, Anomalous Transport and Plasma Science ISBN: 9783030044824
This paper reviews the magnetron electronic valve family development including the: the Barkhausen-Kurz oscillator, split-anode magnetron, cavity-magnetron, rising-sun cavity-magnetron, coaxial cavity-magnetron, relativistic cavity-magnetron and the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbeb4f0282e31ab83aac7f845f3eb4ee
https://doi.org/10.1007/978-3-030-04483-1_2
https://doi.org/10.1007/978-3-030-04483-1_2
Publikováno v:
International Journal of Adhesion and Adhesives. 54:72-81
This paper evaluates the use of an air based atmospheric pressure plasma jet for the activation of carbon fibre epoxy composites. In addition the performance of the jet in the removal of a 5–8 nm thick layer of FreKote 710-NC from the composite sur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e70aa93c3368bcd0ae22f1996496c3ea
https://doi.org/10.1016/j.ijadhadh.2014.05.001
https://doi.org/10.1016/j.ijadhadh.2014.05.001
Publikováno v:
Advanced Powder Technology. 25:1560-1570
The implementation of statistical quality control methods for monitoring and control of powder abrasion/deposition is of increasing importance in a manufacturing environment. For the wider adoption of both current and new powder coating technologies,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a1cd1e4d9bfe1577d901cd1ab1c77a5a
https://doi.org/10.1016/j.apt.2014.05.006
https://doi.org/10.1016/j.apt.2014.05.006
A new process for low‐frequency (300 kHz) pulse plasma etching of GaAs and mask materials (Au, Cu, and Ni) using a mixture of ClCH3 and H2 in the pressure range of 40–80 mTorr is reported. The ion‐bombardment ri and chemical component rc of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7bdbf373820833c9621370ed8d7b2515
https://ora.ox.ac.uk/objects/uuid:93cda387-f57e-4970-aeb2-9c83fc1f9d82
https://ora.ox.ac.uk/objects/uuid:93cda387-f57e-4970-aeb2-9c83fc1f9d82