Zobrazeno 1 - 10
of 28
pro vyhledávání: '"V. I. Svettsov"'
Publikováno v:
High Temperature. 52:348-354
We have investigated the stationary parameters and the composition of the DC glow discharge plasma (p = 40–200 Pa, i = 30–70 mA) in methane by means of the probe technique and numerical simulation. We have obtained data on the reduced strength of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a792f1da931583048698afcfa341b01
https://doi.org/10.1134/s0018151x14020205
https://doi.org/10.1134/s0018151x14020205
Publikováno v:
Russian Microelectronics. 42:212-219
The plasma parameters and mechanisms of gallium arsenide (GaAs) reactive plasma etching in HCl-Ar and HCl-Cl2 mixtures under constant-current glow discharge conditions were investigated. The mathematical simulation of plasma helped to establish that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f16c29c823227aae0efbaf4f17583593
https://doi.org/10.1134/s1063739713040021
https://doi.org/10.1134/s1063739713040021
Publikováno v:
High Energy Chemistry. 47:57-61
The mechanisms of the influence of the initial composition of an HCl-Ar mixture on the kinetics and concentration of chlorine atoms in direct-current glow discharge plasma have been studied. It has been found that an increase in the Ar content at a c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::119a16ad622afef366ab4f3a94c2c626
https://doi.org/10.1134/s0018143913020045
https://doi.org/10.1134/s0018143913020045
Publikováno v:
Russian Microelectronics. 40:371-378
The influence of the initial composition of an HCl-H2 mixture on the steady-state parameters and composition of a dc glow discharge plasma (p = 40–200 Pa, ip = 15–35 mA) is investigated. The calculated data on the electron energy distributions, i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::993ad3d5a9b5e43c3f1fcae5e225b178
https://doi.org/10.1134/s1063739711060059
https://doi.org/10.1134/s1063739711060059
Publikováno v:
Russian Microelectronics. 40:379-382
Chlorine-containing gases are widely used in etching series of materials. In this field, hydrogen chloride is one of the most promising plasma reagents. In this paper, emission spectroscopy techniques have been applied to study an etching of gallium
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f08d20478f2e3538b21964caaea52f43
https://doi.org/10.1134/s1063739711060047
https://doi.org/10.1134/s1063739711060047
Publikováno v:
Russian Microelectronics. 40:316-320
Atomic recombination in chlorine plasma on the surface of the plasma chemical reactor made from molybdenum glass and in the presence of stainless-steel samples is investigated using the relaxation pulsed procedure jointly with absorption spectroscopy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed98a3aea1b1a107007e3b969c7b24d9
https://doi.org/10.1134/s1063739711050040
https://doi.org/10.1134/s1063739711050040
Publikováno v:
High Temperature. 49:491-494
The effect of the composition of a mixture on the electrophysical parameters and emission spectra of HCl-O2 and HCl-Ar plasma was analyzed. Data on the gas temperature and reduced electric-field intensity are obtained. Based on an analysis of the emi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c149b7b51f4b61f2d974edfd7e394839
https://doi.org/10.1134/s0018151x11030163
https://doi.org/10.1134/s0018151x11030163
Publikováno v:
Russian Microelectronics. 39:418-426
A model investigation of parameters and steady-state composition of the HBr plasma under conditions of a dc glow discharge (p = 30–250 Pa, id = 10–30 mA) is performed. The calculated data by the composition of the neutral and ion components of th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::799448a95ee5290be99c0c342d4872d0
https://doi.org/10.1134/s1063739710060077
https://doi.org/10.1134/s1063739710060077
Publikováno v:
High Temperature. 48:639-645
The mechanisms of formation and decay of atoms in the pulsed low-frequency plasma of a chlorine-hydrogen mixture have been studied. The contributions of processes involving all particles of plasma that form the composition of a plasma gap are analyze
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61fa42f2249ccdc80d5937674fbc8b3d
https://doi.org/10.1134/s0018151x10050044
https://doi.org/10.1134/s0018151x10050044
Publikováno v:
Russian Microelectronics. 39:366-375
The model investigation of the effect of the initial composition of the HBr/Ar and HBr/He mixtures on the steady-state parameters and composition of the glow discharge dc plasma (p = 30−250 Pa, i d = 20 mA) is performed. The calculated data on the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d309afd81d2443fb637a5a98c34e5be
https://doi.org/10.1134/s1063739710050082
https://doi.org/10.1134/s1063739710050082