Zobrazeno 1 - 10
of 60
pro vyhledávání: '"V. I. Egorkin"'
Autor:
V. I. Egorkin, V. A. Bespalov, A. A. Zaitsev, V. E. Zemlyakov, V. V. Kapaev, O. B. Kukhtyaeva
Publikováno v:
Semiconductors. 55:1039-1044
Publikováno v:
Russian Microelectronics. 49:445-451
We perform the numerical simulation of the characteristics of normally-off GaN/AlGaN HEMT transistors with a p-gate. The dependences of the threshold voltage on the thickness of the main AlGaN barrier and additional spacer and stop AlN layers are det
Publikováno v:
Proceedings of Universities. Electronics. 25:391-401
The GaN based devices with respect to most parameters exceed the devices based on traditional semiconductor materials. The AlGaN-transistors are the devices, operating in the depletion mode. For most applications it is necessary to implement the oper
Publikováno v:
Semiconductors. 54:895-899
The effect of atomic composition on the rate of the plasma-chemical etching of silicon nitride in high-power transistors based on an AlGaN/GaN heterojunction is studied. It is shown how the subsequent process of its plasma-chemical etching depends on
Publikováno v:
Semiconductors. 53:2012-2015
For silicon carbide, the problem of obtaining low-resistance ohmic contacts with improved service characteristics remains topical despite a significant body of experimental data. The influence exerted by the composition of Ni and TiAl metallization,
Autor:
Andrey A. Shemukhin, Yu. S. Fedotov, A. V. Kozhemiako, A. V. Danilov, V. S. Chernysh, B. Merzuk, A. P. Evseev, V. I. Egorkin
Publikováno v:
Moscow University Physics Bulletin. 74:620-624
4H-SiC was irradiated with Al+ions at an energy of 190 keV. The depth profiles of implanted aluminum were obtained using the secondary ion mass spectrometry method; a comparison was made with profiles calculated in the SRIM program. Using Rutherford
Autor:
K. S. Zhuravlev, Vladimir G. Mansurov, D. Yu. Kazantsev, I. A. Aleksandrov, D. Yu. Protasov, A. A. Zaitsev, Timur V. Malin, A. S. Kozhukhov, D. S. Milakhin, B. Ya. Ber, V. E. Zemlyakov, V. I. Egorkin
Publikováno v:
Technical Physics Letters. 45:761-764
It is shown that intentionally undoped high-resistance GaN buffer layers in AlGaN/GaN heterostructures with high electron mobility for transistors can be formed by ammonia molecular beam epitaxy. The GaN growth conditions have been optimized using ca
Publikováno v:
IEEE Transactions on Power Electronics. 34:3689-3699
The state-of-the-art long-distance near-infrared optical radars use laser-diode-based miniature pulsed transmitters producing optical pulses of 3–10 ns in duration and peak power typically below 40 W. The duration of the transmitted optical pulses
Publikováno v:
Semiconductors. 52:1969-1972
The preparation of ohmic contacts to heterobipolar nanostructures has a number of characteristic features. In addition to the basic requirement of minimizing contact resistance, contacts to this type of structures have a transition layer whose depth
Autor:
V A Gudkov, V. I. Egorkin, V. I. Garmash, Jsc «Prc» Istok named after Shokin», Fryazino, Russia, V.E. Zemlyakov, A. V. Nezhentsev
Publikováno v:
Proceedings of Universities. Electronics. 23:557-564