Zobrazeno 1 - 2
of 2
pro vyhledávání: '"V. G. Pashkovsky"'
Autor:
V. G. Pashkovsky, Vladimir Volynets, K. S. Jeong, T. Y. Kwon, J. B. Lee, Andrey Ushakov, Yu.N. Tolmachev, Dougyong Sung
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26:406-415
Plasma spatial nonuniformities in the 100MHz rf driven capacitively coupled reactor used for reactive ion etching of 300mm substrates were experimentally studied using a linear scanning optical emission spectroscopy probe. Radial profiles of plasma e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::606ab43d1fcb8b5ca001cac32d14b04a
https://doi.org/10.1116/1.2899413
https://doi.org/10.1116/1.2899413
Publikováno v:
Physics of Plasmas. 2:4641-4649
The plasma separation process by ion cyclotron resonance heating (ICRH) is studied both theoretically and experimentally on two devices: the first one called ERIC (Ion Cyclotron Resonance Experiment) at Saclay (France) [P. Louvet, Proceedings of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ada6ef576373ea1f1184a715d1738f8b
https://doi.org/10.1063/1.870955
https://doi.org/10.1063/1.870955