Zobrazeno 1 - 10
of 35
pro vyhledávání: '"V. Edon"'
Publikováno v:
Surface and Coatings Technology. 220:36-39
The interaction of CMAS (an acronym for a mixture of oxides including CaO, MgO, Al2O3, SiO2) with aerospace materials has been studied as part of the degradation of protective coatings on turbine blades, since the presence of these mixture oxides can
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::278e396a541b43dbc040b36f8c2bcec6
https://doi.org/10.1016/j.surfcoat.2012.04.066
https://doi.org/10.1016/j.surfcoat.2012.04.066
Autor:
N Adachi, V Adamovitch, Y Adjovi, K Aida, H Akamatsu, S Akiyama, A Akli, A Ando, T Andrault, H Antonietti, S Anzai, G Arkoun, C Avenoso, D Ayrault, M Banasiewicz, M Banaśkiewicz, L Bernardini, E Bernard, E Berthet, M Blanchard, D Boreyko, K Boros, S Charron, P Cornette, K Czerkas, M Dameron, I Date, M De Pontbriand, F Demangeau, ł Dobaczewski, L Dobrzyński, A Ducouret, M Dziedzic, A Ecalle, V Edon, K Endo, T Endo, Y Endo, D Etryk, M Fabiszewska, S Fang, D Fauchier, F Felici, Y Fujiwara, C Gardais, W Gaul, L Gurin, R Hakoda, I Hamamatsu, K Handa, H Haneda, T Hara, M Hashimoto, T Hashimoto, K Hashimoto, D Hata, M Hattori, R Hayano, R Hayashi, H Higasi, M Hiruta, A Honda, Y Horikawa, H Horiuchi, Y Hozumi, M Ide, S Ihara, T Ikoma, Y Inohara, M Itazu, A Ito, J Janvrin, I Jout, H Kanda, G Kanemori, M Kanno, N Kanomata, T Kato, S Kato, J Katsu, Y Kawasaki, K Kikuchi, P Kilian, N Kimura, M Kiya, M Klepuszewski, E Kluchnikov, Y Kodama, R Kokubun, F Konishi, A Konno, V Kontsevoy, A Koori, A Koutaka, A Kowol, Y Koyama, M Kozioł, M Kozue, O Kravtchenko, W Kruczała, M Kudła, H Kudo, R Kumagai, K Kurogome, A Kurosu, M Kuse, A Lacombe, E Lefaillet, M Magara, J Malinowska, M Malinowski, V Maroselli, Y Masui, K Matsukawa, K Matsuya, B Matusik, M Maulny, P Mazur, C Miyake, Y Miyamoto, K Miyata, M Miyazaki, M Molȩda, T Morioka, E Morita, K Muto, H Nadamoto, M Nadzikiewicz, K Nagashima, M Nakade, C Nakayama, H Nakazawa, Y Nihei, R Nikul, S Niwa, O Niwa, M Nogi, K Nomura, D Ogata, H Ohguchi, J Ohno, M Okabe, M Okada, Y Okada, N Omi, H Onodera, K Onodera, S Ooki, K Oonishi, H Oonuma, H Ooshima, H Oouchi, M Orsucci, M Paoli, M Penaud, C Perdrisot, M Petit, A Piskowski, A Płocharski, A Polis, L Polti, T Potsepnia, D Przybylski, M Pytel, W Quillet, A Remy, C Robert, M Sadowski, M Saito, D Sakuma, K Sano, Y Sasaki, N Sato, T Schneider, C Schneider, K Schwartzman, E Selivanov, M Sezaki, K Shiroishi, I Shustava, A Śniecińska, E Stalchenko, A Staroń, M Stromboni, W Studzińska, H Sugisaki, T Sukegawa, M Sumida, Y Suzuki, K Suzuki, R Suzuki, H Suzuki, W Świderski, M Szudejko, M Szymaszek, J Tada, H Taguchi, K Takahashi, D Tanaka, G Tanaka, S Tanaka, K Tanino, K Tazbir, N Tcesnokova, N Tgawa, N Toda, H Tsuchiya, H Tsukamoto, T Tsushima, K Tsutsumi, H Umemura, M Uno, A Usui, H Utsumi, M Vaucelle, Y Wada, K Watanabe, S Watanabe, K Watase, M Witkowski, T Yamaki, J Yamamoto, T Yamamoto, M Yamashita, M Yanai, K Yasuda, Y Yoshida, A Yoshida, K Yoshimura, M Żmijewska, E Zuclarelli
Publikováno v:
Journal of Radiological Protection
Journal of Radiological Protection, 2016, 36 (1), pp.49-66. ⟨10.1088/0952-4746/36/1/49⟩
Journal of Radiological Protection, 2016, 36 (1), pp.49-66. ⟨10.1088/0952-4746/36/1/49⟩
Twelve high schools in Japan (of which six are in Fukushima Prefecture), four in France, eight in Poland and two in Belarus cooperated in the measurement and comparison of individual external doses in 2014. In total 216 high-school students and teach
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9d38f783106cd5e689b1c2c915d82365
https://hal.archives-ouvertes.fr/hal-03121954
https://hal.archives-ouvertes.fr/hal-03121954
Publikováno v:
Applied Surface Science
Applied Surface Science, Elsevier, 2009, 256, pp.1455-1460. ⟨10.1016/j.apsusc.2009.09.002⟩
Applied Surface Science, 2009, 256, pp.1455-1460. ⟨10.1016/j.apsusc.2009.09.002⟩
Applied Surface Science, Elsevier, 2009, 256, pp.1455-1460. ⟨10.1016/j.apsusc.2009.09.002⟩
Applied Surface Science, 2009, 256, pp.1455-1460. ⟨10.1016/j.apsusc.2009.09.002⟩
In this work, 0.30 μm thick LiNbO3 layers have been deposited by sputtering on nanocrystalline diamond/Si and platinised Si substrates. The films were then analyzed in terms of their structural and optical properties. Crystalline orientations along
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9f20e32e0e5ddd7a6c42097130a2491f
https://doi.org/10.1016/j.apsusc.2009.09.002
https://doi.org/10.1016/j.apsusc.2009.09.002
Publikováno v:
physica status solidi c. 5:1206-1209
Composition and interfacial properties of LaAlO3/Si thick (50 nm) and thin (7 nm) films were accessed by Far Ultra-Violet Spectroscopic Ellipsometry (FUV-SE), X-Ray Reflectometry (XRR) and X-Ray Photoelectron Spectroscopy (XPS). FUV-SE correlated to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59585fc09f17d3763d392bbe94f88c93
https://doi.org/10.1002/pssc.200777839
https://doi.org/10.1002/pssc.200777839
Autor:
Israel Jacob Rabin Baumvol, V. Edon, B. Agius, Carlos Driemeier, L. Miotti, Karen Paz Bastos, Francine Tatsch, M. C. Hugon, C. Krug
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 249:366-369
La and Hf aluminates are promising candidates to replace SiO 2 as gate dielectric for future Si-based metal–oxide–semiconductor devices. In this study, ion beam analyses were employed to investigate the composition of La and Hf aluminate thin fil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb13de29afc4672dbfac61617fef3bec
https://doi.org/10.1016/j.nimb.2006.04.030
https://doi.org/10.1016/j.nimb.2006.04.030
Publikováno v:
Journal of Physics D: Applied Physics. 38:3446-3450
The evolution of the OH radical density was measured in the afterglow of a pulsed homogeneous discharge using time-resolved laser induced fluorescence, and the acetaldehyde removal was quantified using chromatography for N2/O2/CH3CHO mixtures at 460
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2798cd33cdb9781341b576ea3bfce04b
https://doi.org/10.1088/0022-3727/38/18/019
https://doi.org/10.1088/0022-3727/38/18/019
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2007, 515 (20-21), pp.7782. ⟨10.1016/j.tsf.2007.03.179⟩
Thin Solid Films, 2007, 515 (20-21), pp.7782. ⟨10.1016/j.tsf.2007.03.179⟩
Thin Solid Films, Elsevier, 2007, 515 (20-21), pp.7782. ⟨10.1016/j.tsf.2007.03.179⟩
Thin Solid Films, 2007, 515 (20-21), pp.7782. ⟨10.1016/j.tsf.2007.03.179⟩
In order to investigate the effects of the sputter deposition parameters and the influence of the post-deposition thermal treatment on the LaAlO3/Si interface, Rutherford Backscattering Spectrometry (RBS), ion channeling, Nuclear Reaction Analysis (N
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::391933fbf62a5504551f2554d64ce0cc
https://hal.archives-ouvertes.fr/hal-00391760
https://hal.archives-ouvertes.fr/hal-00391760
Autor:
M. C. Hugon, Claudio Radtke, Isabelle Trimaille, Felipe Wolff Tatsch, J.-J. Ganem, V. Edon, Ijr Baumvol, B. Agius, L. Miotti
Publikováno v:
Applied physics. A, Materials science & processing
Applied physics. A, Materials science & processing, 2006, 83 (2), pp.289-293. ⟨10.1007/s00339-006-3484-5⟩
Applied physics. A, Materials science & processing, Springer Verlag, 2006, 83 (2), pp.289-293. ⟨10.1007/s00339-006-3484-5⟩
Applied physics. A, Materials science & processing, 2006, 83 (2), pp.289-293. ⟨10.1007/s00339-006-3484-5⟩
Applied physics. A, Materials science & processing, Springer Verlag, 2006, 83 (2), pp.289-293. ⟨10.1007/s00339-006-3484-5⟩
International audience; The influence of processing parameters on the electrical characteristics of RuO2/LaAlO3/Si metal-oxide-semiconductor structures was investigated. In particular, the sputtering regime during deposition of LaAlO3 on Si and the a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::63042443ddbaee72e19590740fac7150
https://hal.science/hal-01288830
https://hal.science/hal-01288830
Publikováno v:
Journal of Physics: Conference Series. 303:012094
In order to grow nanocrystallized soft magnetic thin films, FeCoC alloys were first deposited by reactive sputtering in Ar/C2H2 plasma. This deposition process rendered it possible to incorporate a carbon content between 0 and 30 at.% into the FeCo s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6474b1ae34ec1dd816dcf51793d24de
https://doi.org/10.1088/1742-6596/303/1/012094
https://doi.org/10.1088/1742-6596/303/1/012094
Publikováno v:
Journal of Applied Physics. 107:09A321
Fe65Co35 and Fe9.5Co90.5 thin films with carbon addition were deposited by reactive sputtering and investigated in terms of static and dynamic magnetic properties. The acetylene rate was adjusted in order to deposit nanocrystalline soft magnetic film
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a449d6de8031a82bc400fefafae7319e
https://doi.org/10.1063/1.3356232
https://doi.org/10.1063/1.3356232