Zobrazeno 1 - 6
of 6
pro vyhledávání: '"V. E. Shkrunin"'
Autor:
L. V. Shabarova, R. A. Kornev, A. A. Ermakov, V. E. Shkrunin, A. I. Shishkin, A. A. Belov, P. S. Kalyasov
Publikováno v:
Plasma Chemistry and Plasma Processing. 42:1381-1403
Autor:
R. A.Kornev, P. G. Sennikov, I. B. Gornushkin, A. A.Ermakov, V. E. Shkrunin, V. S. Polykov, A. R. Kornev, K. D. Kornev
Publikováno v:
Plasma Chemistry and Plasma Processing. 42:395-412
Autor:
V. S. Polyakov, V. V. Nazarov, Petr G. Sennikov, I. B. Gornushkin, V. E. Shkrunin, R. A. Kornev
Publikováno v:
Plasma Chemistry and Plasma Processing. 41:673-690
The physical plasma parameters, temperature and electron number density, are studied in the RF-IC (RF inductively coupled) discharge at a reduced pressure of 3 Torr in mixtures of MoF6 with Ar, H2 and CH4. The emission spectra of mixtures are investi
Publikováno v:
Plasma Chemistry and Plasma Processing. 40:1639-1640
Autor:
I. B. Gornushkin, V. S. Polyakov, R. A. Kornev, V. E. Shkrunin, Petr G. Sennikov, A.A. Ermakov
Publikováno v:
Journal of Fluorine Chemistry. 241:109692
Tetrafluorosilane (SF4) and tetrachlorosilane (SiCl4) plasmas have been widely used as a source of either F or Cl for etching silicon or as a source of silicon for deposition of Si-based materials. Using different combinations of F and Cl in molecule
Publikováno v:
The Journal of Physical Chemistry. 100:6415-6420
The results of an IR spectroscopic study of the dilute ethanol solutions in liquid hydrides of group IV−VI elements in the temperature range from boiling point Tb of the hydride up to 290 K (250 K for silane) are given. Similar to ethanol solutions