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Autor:
Gostishchev, P., Luchnikov, L. O., Bronnikov, O., Kurichenko, V., Muratov, D. S., Aleksandrov, A. A., Tameev, A. R., Tyukhova, M. P., V., S. Le Badurin. I., V., Ryabtseva M., Saranin, D., Di Carlo, A.
Ion-beam sputtering offers significant benefits in terms of deposition uniformity and pinhole-free thin-films without limiting the scalability of the process. In this work, the reactive ion-beam sputtering of nickel oxide has been developed for the h
Externí odkaz:
http://arxiv.org/abs/2306.16949