Zobrazeno 1 - 10
of 37
pro vyhledávání: '"Uwe Dietze"'
Autor:
J. Kruemberg, Jens Rip, Antoine Pacco, D. Dattilo, Frank Holsteyns, R. Jonckheere, Uwe Dietze
Publikováno v:
Solid State Phenomena. 255:357-360
In order to evaluate the effect of repeated cleaning on EUV reticles, specifically, on the etched Mo/Si multilayer, wafer-based test structures with a mimic of this etched Mo/Si multilayer (“black-border”) were fabricated. The resistance of Mo an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a7bc05d25f3e31ed574a5b52dec3c7f
https://doi.org/10.4028/www.scientific.net/ssp.255.357
https://doi.org/10.4028/www.scientific.net/ssp.255.357
Publikováno v:
Photomask Technology 2018.
A pellicle is employed to protect a photomask from particle contamination. The pellicle is positioned at a distance from the photomask pattern such that particle contaminants are out of focus. To extend the lifetime of a photomask, the pellicle must
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22447bce01ad430dbbecb743ca4d00ae
https://doi.org/10.1117/12.2503937
https://doi.org/10.1117/12.2503937
Publikováno v:
32nd European Mask and Lithography Conference.
Megasonic cleaning remains the industry’s workhorse technology for particle removal on advanced 193i and extreme ultraviolet (EUV) photomasks. Several megasonic cleaning technologies and chemistries have been proposed and implemented over the years
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::867166aa15004eee5a5ea4c67191f6e0
https://doi.org/10.1117/12.2248594
https://doi.org/10.1117/12.2248594
Autor:
Jyh-Wei Hsu, Uwe Dietze, Ai-Jay Ma, Peter Chang, Laurent C. Tuo, Chia-Shih Lin, Peter Dress, Martin Samayoa, Rick Lai
Publikováno v:
SPIE Proceedings.
One of the main challenges in photomask cleaning is balancing particle removal efficiency (PRE) with pattern damage control. To overcome this challenge, a high frequency megasonic cleaning strategy is implemented. Apart from megasonic frequency and p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4bed8c4f40598d5597b354bc752d29b
https://doi.org/10.1117/12.2241143
https://doi.org/10.1117/12.2241143
Autor:
Uwe Dietze, Osamu Katada, Takehiko Ueno, Klaus Beschorner, Yoshio Kawanobe, Toshiaki Ando, Hiroyuki Ishida, Ishida Shingo
Publikováno v:
SPIE Proceedings.
Nano Imprint Lithography (NIL) is valued as a cost effective alternative to other Next Generation Lithography (NGL) choices, especially for memory device applications. In order to achieve an attractive Cost of Ownership (CoO), replicas are made from
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::015ccfbc910c6c4f6ee54e27656359a4
https://doi.org/10.1117/12.2242498
https://doi.org/10.1117/12.2242498
Publikováno v:
ECS Transactions. 27:467-472
Extreme Ultra-Violet Lithography (EUVL) and Nano-Imprint Lithography (NIL) are the two leading candidates for next generation lithography (NGL). New image projection methods and materials have led to inherent changes in the way EUVL masks and NIL tem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4236b3825477b05f620378dfffa78051
https://doi.org/10.1149/1.3360661
https://doi.org/10.1149/1.3360661
Publikováno v:
uwf UmweltWirtschaftsForum. 16:143-147
Wegen hoher Investitionskosten sind sehr kleine KWK-Anlagen noch nicht sehr weit verbreitet und werden kaum genutzt, obwohl sie aufgrund ihrer hohen Wirkungsgrade einen Beitrag zum Klimaschutz leisten konnen. In unserem Beitrag wollen wir untersuchen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a969eecf6c116a1afe5dddfc6153923
https://doi.org/10.1007/s00550-008-0085-0
https://doi.org/10.1007/s00550-008-0085-0
Publikováno v:
SPIE Proceedings.
In the absence of pellicle a EUVL reticle is expected to withstand up to 100x cleaning cycles. Surface damage upon wet and dry cleaning methods has been investigated and reported in recent years. [1] Thermal stress, direct photochemical oxidation and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6db14eb8b447c61ad1b882d39dce193
https://doi.org/10.1117/12.2202188
https://doi.org/10.1117/12.2202188
Autor:
Jun Yeol Choi, Byung-Gook Kim, Soowan Koh, Davide Dattilo, Chan-Uk Jeon, Uwe Dietze, Jeff Lowe, Tsutomu Shoki, Jaehyuck Choi, Jin-Su Kim
Publikováno v:
SPIE Proceedings.
EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c26edc46d70c9e1cf58172af149fbec
https://doi.org/10.1117/12.2197226
https://doi.org/10.1117/12.2197226
Autor:
Wolfgang Körner, Till Luckenbach, Gerrit Schüürmann, Marija Strmac, Julia Schwaiger, Simonetta Siligato, Reinhold Lehmann, Wolfgang Honnen, Stefan Adam, Thomas Braunbeck, Stefanie Beier, Axel Oberemm, Rita Triebskorn, Uwe Dietze, Maike Gernhöfer, Jens Konradt, Jürgen Böhmer, Heidi Casper, Heinz-R. Köhler, Helmut Segner, Walter Traunspurger, Anja Behrens
Publikováno v:
Scopus-Elsevier
The study summarizes the objectives of the VALIMAR project and gives selected examples of biomarker responses that allow causal relationships to be established between exposure and biological effects at different levels of biological organization. In
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::973e3afa02981e67997afd90b30fcfec
https://doi.org/10.1080/713609858
https://doi.org/10.1080/713609858