Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Ute Natura"'
Publikováno v:
SPIE Proceedings.
Single crystal calcium fluoride (CaF 2 ) is an important lens material in deep-ultraviolet optics, where it is exposed to high radiation densities. The known rapid damage process in CaF 2 upon ArF laser irradiation cannot account for irreversible dam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::904dd5ae2db89502fb780f82c25fdbb0
https://doi.org/10.1117/12.836404
https://doi.org/10.1117/12.836404
Publikováno v:
SPIE Proceedings.
Crystalline calcium fluoride is one of the key materials for 193 nm lithography and is used for laser optics, beam delivery system optics and stepper/scanner optics. Laser damage occurs, when light is absorbed, creating defects in the crystal. Haze i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a590cd79a7c816a68f9a225e8c97e84
https://doi.org/10.1117/12.836409
https://doi.org/10.1117/12.836409
Publikováno v:
Laser-Induced Damage in Optical Materials: 2008.
We report on two approaches to strongly shorten life time testing of fused silica’s absoption degradation upon 193 nm laser irradiation. Both approaches are based on enhancing the two photon absorption (TPA) induced generation of E’ and NBOH defe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c1e73dfedcfda0e2162d0f7d8631a7b
https://doi.org/10.1117/12.804286
https://doi.org/10.1117/12.804286
Autor:
Alfons Burkert, Ute Natura
Publikováno v:
Laser-Induced Damage in Optical Materials: 2008.
Fused Silica is one of the key materials for 193 nm and 248 nm lithography as well as Laser Fusion experiments (355nm windows) and is used for laser optics, beam delivery system optics and stepper/scanner optics for different wavelengths including ex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a340cc14de894615cbd27066e48e957
https://doi.org/10.1117/12.804474
https://doi.org/10.1117/12.804474
Publikováno v:
SPIE Proceedings.
Transmission, absorption and laser induced fluorescence (LIF) measurements were performed to reveal the applicability of different grade CaF 2 for 248 nm laser applications. No emission from self-trapped excitions could be found in LIF measurements a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59f1ab678fa641e3100fc5f48dc32e15
https://doi.org/10.1117/12.752813
https://doi.org/10.1117/12.752813
Publikováno v:
SPIE Proceedings.
Crystalline calcium fluoride is one of the key materials for 193nm lithography and is used for laser optics, beam delivery system optics and stepper/scanner illumination optics. In comparison to fused silica it shows a much higher laser durability. H
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a62f3ec7b3550c13e498825bee566bc
https://doi.org/10.1117/12.712108
https://doi.org/10.1117/12.712108
Autor:
A. Burkert, Angela Duparré, Lutz Dr. Parthier, Ch. Muehlig, Ute Natura, Wolfgang Triebel, Sven Schroeder, Stefan Gliech, Dietmar Dr. Keutel
Publikováno v:
SPIE Proceedings.
Combined measurements of transmission T , absorption A and total scattering TS revealed the high accuracy of all applied measurement techniques by obtaining a sum T+A+TS+R = (100±0.3)% (R denotes the Fresnel reflection). In order to investigate CaF
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ff35d1c621e3810f63ae2553c6c9037
https://doi.org/10.1117/12.616904
https://doi.org/10.1117/12.616904
Autor:
Ute Natura, Christian Muehlig, Karin Dr. Pöhl, Lutz Dr. Parthier, Martin Letz, Konrad Knapp, Guenter Grabosch
Publikováno v:
SPIE Proceedings.
Photolithography is a key technolgoy for the production of semiconductor devices. It supports the continuing trend towards higher integration density of microelectronic devices. The material used in the optics of lithography tools has to be of extrem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::817780f8db53613c38e21bcbaa6d632c
https://doi.org/10.1117/12.585247
https://doi.org/10.1117/12.585247
Publikováno v:
SPIE Proceedings.
Excimer laser radiation changes the optical properties of fused silica. These changes include radiation induced absorption and changes of the index of refraction, which in turn determine the expected lifetime of silica lenses used in optical microlit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f81768dc3e07e1a06de3abcbc7b8fcc9
https://doi.org/10.1117/12.521739
https://doi.org/10.1117/12.521739
Publikováno v:
SPIE Proceedings.
Fused silica is used as lens material in DUV microlithography systems. The exposure of fused silica to high-energy excimer laser pulses over long periods of time modifies the material. Marathon experiments were conducted at different energy densities
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29064720adb8cc8c1b9bdde793286d48
https://doi.org/10.1117/12.531653
https://doi.org/10.1117/12.531653