Zobrazeno 1 - 10
of 847
pro vyhledávání: '"Upadhyay J"'
Publikováno v:
Journal of Pain Research, Vol Volume 9, Pp 671-681 (2016)
Jaymin Upadhyay,1 Julia Granitzka,1 Thomas Bauermann,2 Ulf Baumgärtner,3 Markus Breimhorst,1 Rolf-Detlef Treede,3 Frank Birklein1 1Department of Neurology, 2Department of Neuroradiology, University Medical Centre, Johannes Gutenberg University Mainz
Externí odkaz:
https://doaj.org/article/1b941905d3b64afd984f63374f80637d
Publikováno v:
In International Journal of Oral & Maxillofacial Surgery December 2024 53(12):1006-1014
Publikováno v:
In Alcohol June 2024 117:43-54
Publikováno v:
In Nuclear Inst. and Methods in Physics Research, A 1 July 2022 1034
Autor:
Upadhyay, J., Palczewski, A., Popović, S., Valente-Feliciano, A. -M., Im, D., Phillips, L., Vušković, L.
Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the
Externí odkaz:
http://arxiv.org/abs/1605.06494
Autor:
Upadhyay, J., Im, Do, Peshl, J., Bašović, M., Popović, S., Valente-Feliciano, A. -M., Phillips, L., Vuškovića, L.
An apparatus and a method are described for plasma etching of the inner surface of superconducting radio frequency (SRF) cavities. Accelerator SRF cavities are formed into a variable-diameter cylindrical structure made of bulk niobium, for resonant g
Externí odkaz:
http://arxiv.org/abs/1511.04464
The reduction of the asymmetry in the plasma sheath voltages of a cylindrical coaxial capacitively coupled plasma is crucial for efficient surface modification of the inner surfaces of concave three-dimensional structures, including superconducting r
Externí odkaz:
http://arxiv.org/abs/1507.00059
An rf coaxial capacitively coupled Ar/Cl2 plasma is applied to processing the inner wall of superconducting radio frequency cavities. A dc self-bias potential is established across the inner electrode sheath due to the surface area difference between
Externí odkaz:
http://arxiv.org/abs/1506.05167
The understanding of the Ar/Cl2 plasma etching mechanism is crucial for the desired modification of inner surface of the three dimensional niobium (Nb) superconductive radio frequency cavities. Uniform mass removal in cylindrical shaped structures is
Externí odkaz:
http://arxiv.org/abs/1411.0176
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which
Externí odkaz:
http://arxiv.org/abs/1411.0175